Skip to main content
SpringerLink
Log in

SU-8: promising resist for advanced direct LIGA applications for high aspect ratio mechanical microparts

  • Technical paper
  • Published:
Microsystem Technologies Aims and scope Submit manuscript

Abstract

A case study of use of negative type SU-8 X-ray sensitive resist for fabrication of advanced, highly precise, ultra tall direct LIGA mechanical microparts is presented in this paper. Using direct LIGA technique, ∼1 mm tall highly precise metallic gear wheels are being fabricated, previously using PMMA based process. Starting from a non-optimized non-satisfying SU-8 process, significant process parameters for process optimization were identified using statistical design of experiment. By varying the significant process parameters, SU-8 process was further optimized with respect to critical aspect of sidewall bow and tilt of metallic structures. After the optimization, metallic parts fabricated using SU-8 process showed comparable quality as those fabricated using PMMA based process.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8

Similar content being viewed by others

Notes

  1. This work widely uses the contents of the presentation ‘comparative study of the sidewall profile of PMMA and SU-8 moulds made by UDXRL and of electroformed metallic counterpart’ to the high aspect ratio micro structure technology workshop HARMST 2005 held in Gyeongyu (Republic of Korea), June 10–13, 2005.

References

  • Achenbach S (2000) Optimierung zur Herstellung von Mikrostrukturen durch Ultratiefe Röntgenlithographie (UDXRL). PhD Thesis, University Karlsruhe

  • Degen R, Slotter R (2004) Zero Backlash Micro-Gears and Actuators for Microassembly Applications, www.harmonicdrive.de/de/pdf/fachauf_18.pdf

  • Engelke R, Ahrens G, Ruhmann R, Kopetz S, Kastner J, Wiesauer K, Stifter D, Loechel B, Neyer A, Gruetzner G (2005) Possibilities of Inline Process Inspection of High Aspect ratio LIGA Microstructures, HARMST

  • Grützner G, Ruhmann R, Ahrens G, Bednarzik M, Loechel B, Limbecker P, Goettert J, Desta Y, Singh V (2003) Improved process parameters and impact on structure quality of high aspect ratio SU-8 microstructures, HARMST, Monterey

  • Mentz W, Mohr J (1997) Mikrosystemtechnik fuer ingenieure. VCH Verlaggesselschaft mbH, Weinheim

    Google Scholar 

  • Ruhmann R, Ahrens G, Grützner G, Staufenbiel NA, Schoeder H (2005) Residual solvent content distribution in ultra-thick SU-8 films and its influence on the imagin quality, HARMST, Gyeongju

  • Scheunemann H-U, Loechel B, Jian L, Scheunemann H-U, Schondelmaier D, Goettert J, Desta YM, Ling Z-G, Morris T, Joonyoung J, Singh V, Degen R, Kirsch U, Gruetzner G, Ruhmann R, Ahrens G (2002) Providing a direct-LIGA service—A status report, COMS 2002. Ypsilanti, Michigan

Download references

Acknowledgments

Authors would like to thank to all participants and contributors to this work, especially to co-workers from BESSY GmbH, microresist technology GmbH, Micromotion GmbH, CAMD and University of Dortmund. This research was partially supported by the initiative of the Federal Ministry of Education (BMBF), Berlin.

Author information

Authors and Affiliations

  1. BESSY GmbH, Albert-Einstein-Str. 15, 12489, Berlin, Germany

    J. Kouba, M. Bednarzik, Heinz-Ulrich Scheunemann & B. Loechel

  2. Microresist technology, Koepenicker Str. 32, 12555, Berlin, Germany

    R. Engelke, G. Ahrens & G. Gruetzner

  3. MicroChem Corporation, 1254 Chestnut Street, Newton, MA, 02464, USA

    H. Miller

  4. Jenoptik Mikrotechnik GmbH, Goeschwitzerstr. 40, 07745, Jena, Germany

    D. Haase

Authors
  1. J. Kouba
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. R. Engelke
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. M. Bednarzik
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. G. Ahrens
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Heinz-Ulrich Scheunemann
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. G. Gruetzner
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. B. Loechel
    View author publications

    You can also search for this author in PubMed Google Scholar

  8. H. Miller
    View author publications

    You can also search for this author in PubMed Google Scholar

  9. D. Haase
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to J. Kouba.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Kouba, J., Engelke, R., Bednarzik, M. et al. SU-8: promising resist for advanced direct LIGA applications for high aspect ratio mechanical microparts. Microsyst Technol 13, 311–317 (2007). https://doi.org/10.1007/s00542-006-0178-z

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00542-006-0178-z

Keywords

Search

Navigation