Abstract
Within the last three decades, thin films grown by physical vapor deposition methods have found widespread applications. This article reports about recent research examples on molybdenum thin films, as used for thin film transistor liquid crystal displays, and on TiN diffusion barrier films, as used for microelectronics.
Zusammenfassung
Innerhalb der letzten drei Jahrzehnte haben dünne mit Hilfe der physikalischen Dampfphasenabscheidung hergestellte Schichten breite Anwendung gefunden. Dieser Beitrag berichtet über jüngste Forschungsbeispiele von Molybdänschichten für Dünnschichttransistor-Flüssigkristall-Bildschirme und von TiN-Barriereschichten für die Mikroelektronik.
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Acknowledgements
The part of this work on functional display thin films was supported by the Forschungsförderungsgesellschaft mbH within the Headquarters project E2SPUTTERTECH. Financial support for the activities on diffusion barrier layers by the Austrian Federal Government (in particular by the Bundesministerium für Verkehr, Innovation und Technologie and Bundesministerium für Wirtschaft, Familie und Jugend) represented by Österreichische Forschungsförderungsgesellschaft mbH and the Styrian and the Tyrolean Provincial Governments, represented by Steirische Wirtschaftsförderungsgesellschaft mbH and Standortagentur Tirol, within the framework of the COMET Funding Programme is also gratefully acknowledged. The authors are also grateful to Dr. Jörg Winkler, PLANSEE SE, Reutte, Austria, for collaboration and helpful discussions.
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Mitterer, C., Jörg, T., Franz, R. et al. Functional Thin Films for Display and Microelectronics Applications. Berg Huettenmaenn Monatsh 160, 231–234 (2015). https://doi.org/10.1007/s00501-015-0354-5
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DOI: https://doi.org/10.1007/s00501-015-0354-5