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Fabrication of planar photonic crystals in chalcogenide glass film by maskless projection lithography

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Abstract

Ge20Sb15Se65 chalcogenide glass films were deposited and patterned using maskless projection lithography to create photonic crystal structures. This lithography technology, which is based on a digital micro-mirror device, is demonstrated as a powerful and low-cost tool to produce arbitrary intensity distributions to fabricate photonic devices. Direct photolithography in resist-free chalcogenide films was first studied, and results indicate that the quality of the products is insufficient. High-quality photonic crystals with sub-micrometer size were finally obtained in chalcogenide films with photoresist by maskless projection lithography and inductively coupled plasma technology.

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Acknowledgments

This work was supported by the National Natural Science Foundation of China (Nos. 61307060, 61435009) and K. C. Wong Magna Fund in Ningbo University.

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Authors and Affiliations

  1. Laboratory of Infrared Material and Devices, Advanced Technology Research Institute, Ningbo University, Ningbo, 315211, China

    Peiqing Zhang, Qian Zhang, Jianghui Zeng, Jintao Han, Jie Zhou, Wei Zhang, Qing Jiao, Yuehao Wu & Shixun Dai

  2. Key Laboratory of Photoelectric Materials and Devices of Zhejiang Province, Ningbo, 315211, China

    Peiqing Zhang, Qian Zhang, Jianghui Zeng, Jintao Han, Jie Zhou, Wei Zhang, Qing Jiao, Yuehao Wu & Shixun Dai

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  1. Peiqing Zhang
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  2. Qian Zhang
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  3. Jianghui Zeng
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  5. Jie Zhou
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  6. Wei Zhang
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Correspondence to Peiqing Zhang or Shixun Dai.

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Zhang, P., Zhang, Q., Zeng, J. et al. Fabrication of planar photonic crystals in chalcogenide glass film by maskless projection lithography. Appl. Phys. B 122, 244 (2016). https://doi.org/10.1007/s00340-016-6521-x

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