Spectral interferometric technique to measure the relative phase change on reflection from a thin-film structure

Abstract

A two-step white-light spectral interferometric technique to measure the relative phase change on reflection from a thin-film structure is presented. The technique is based on recording of the channeled spectra at the output of a Michelson interferometer and their processing by using a windowed Fourier transform to retrieve the phase functions. In the first step, the phase difference between the beams of the interferometer with a thin-film structure is retrieved. In the second step, the structure is replaced by a reference sample of known phase change on reflection and the corresponding phase difference is retrieved. From the two phase differences, the relative phase change on reflection from the thin-film structure is obtained. The feasibility of the simple method is confirmed in processing the experimental data for a SiO₂ thin film on a Si wafer of known optical constants. Four samples of the thin film are used and their thicknesses are determined. The thicknesses obtained are compared with those resulting from reflectometric measurements, and good agreement is confirmed.