Abstract.
Diamond-like carbon (DLC) films have been grown on Si substrates at ambient temperature by the pulsed-laser ablation technique, using pulses of different durations both in the nano- and picosecond ranges and at various energy fluences. The stability of these films was investigated as a function of thermal anneals performed in UHV conditions up to 1273 K. Their physico-chemical properties have been characterized by different techniques including X-ray photo-emission, Auger electron and electron-energy-loss spectroscopies, Raman scattering, spectroscopic ellipsometry and atomic-force microscopy. The thermal stability of the films has been demonstrated to be related to their initial structural (sp3/sp2 ratio) and chemical (contaminant) properties. DLC layers prepared under optimized conditions have been found to show a very good thermal stability up to 900 K.
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Received: 4 Jule 2000 / Accepted: 6 July 2000 / Published online: 6 September 2000
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Rey, S., Antoni, F., Prevot, B. et al. Thermal stability of amorphous carbon films deposited by pulsed laser ablation. Appl Phys A 71, 433–439 (2000). https://doi.org/10.1007/s003390000618
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DOI: https://doi.org/10.1007/s003390000618