Abstract
Electrophysical properties of nanostructured (Ni80Fe20)xAu1-x thin films containing from 20 to 52 at.% of Au were investigated. All samples are characterized by metallic behavior upon annealing within the temperature range from 300 to 750 K. It was demonstrated that the resistivity is sensitive to the composition of the samples. Their value for the sample with 20 at.% of Au differs five times in comparison with the sample with 52 at.% of Au. The slope of the temperature dependence of resistivity depends on the composition of the samples too. This is caused by the effectiveness of electron–phonon interaction and peculiarities of the morphology of the samples. The temperature coefficient of resistance takes a positive value, has an order of 10−3 K−1, and grows with an increase of Au content.
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This work was funded by the State Program of the Ministry of Education and Science of Ukraine 0120U102005.
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Pazukha, I.M., Lohvynov, A.M. & Pylypenko, O.V. Effect of Au concentration on electrophysical properties of nanostructured (Ni80Fe20)xAu1-x thin films. Appl. Phys. A 128, 760 (2022). https://doi.org/10.1007/s00339-022-05907-0
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DOI: https://doi.org/10.1007/s00339-022-05907-0