Abstract
Lanthanum oxide-based films were deposited on n-Si and quartz substrates using e-beam evaporation method. The XRD patterns demonstrated mixed structure consisting of La2O3 and La(OH)3 phases (referred as La2O3–OH). Optical and electrical properties of La2O3–OH films, as well as the effects of the annealing and storage conditions on these properties are described here. It is observed that conductance–voltage characteristics of Al/La2O3–OH/n-Si devices along with current rectification show negative differential conductance as a result of water molecule redox reaction on the film surface.
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The authors gratefully acknowledge support for this work by Armenian National Science and Education fund grant program, ANSEF (Grant No. 3913).
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Igityan, A., Aghamalyan, N., Petrosyan, S. et al. Electrical and optical properties of lanthanum oxide-based films prepared by electron beam evaporation. Appl. Phys. A 123, 448 (2017). https://doi.org/10.1007/s00339-017-1057-4
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DOI: https://doi.org/10.1007/s00339-017-1057-4