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Crystallization and atomic diffusion behavior of high coercive Ta/Nd–Fe–B/Ta-based permanent magnetic thin film

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Abstract

A high coercivity of about 20.4 kOe was obtained through post-annealing the sputtered Ta/Nd–Fe–B/Ta-based permanent magnetic thin films. Transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS) analyses were performed to investigate the crystallization and atomic diffusion behaviors during post-annealing. The results show that the buffer and capping Ta layers prefered to intermix with Fe and B atoms, and Nd tends to be combined with O atoms. The preferred atomic combination caused the appearance of the soft magnetic phase of Fe–Ta–B, resulting in a kink of the second quadratic magnetic hysteresis loop. The preferred atomic diffusion and phase formation of the thin films were well explained in terms of the formation enthalpy of the various compounds.

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Acknowledgements

This work was in part supported by the National Natural Science Foundation of China (Nos. 51301129, 51171148, 51371140), Fok Ying Tong Education Foundation (No.131103), the Research project for Key Laboratory of Shaanxi Provincial Department of Education (No. 15JS081).

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Authors and Affiliations

  1. School of Materials Science and Engineering, Xi’an University of Technology, 710048, Xi’an, People’s Republic of China

    Na Tian, Xiao Zhang, Caiyin You & Huarui Fu

  2. Logistics University of People’s Armed Police Force, 300309, Tianjin, People’s Republic of China

    Qianlong Shen

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  1. Na Tian
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  2. Xiao Zhang
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  3. Caiyin You
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  4. Huarui Fu
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Correspondence to Na Tian.

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Tian, N., Zhang, X., You, C. et al. Crystallization and atomic diffusion behavior of high coercive Ta/Nd–Fe–B/Ta-based permanent magnetic thin film. Appl. Phys. A 123, 414 (2017). https://doi.org/10.1007/s00339-017-1038-7

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  • DOI: https://doi.org/10.1007/s00339-017-1038-7

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