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Polycrystalline VO2 thin films via femtosecond laser processing of amorphous VO x

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Abstract

Femtosecond laser processing of pulsed laser-deposited amorphous vanadium oxide thin films was investigated. Polycrystalline VO2 thin films were achieved by femtosecond laser processing in air at room temperature. The electrical transport properties, crystal structure, surface morphology, and optical properties were characterized. The laser-processed films exhibited a metal–insulator phase transition characteristic of VO2, thus presenting a pathway for the growth of crystalline vanadium dioxide films on low-temperature substrates.

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Acknowledgments

This work was funded by the Office of Naval Research (ONR) through the Naval Research Laboratory Basic Research Program.

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Authors and Affiliations

  1. Materials Science and Technology Division, Naval Research Laboratory, Washington, DC, 20375, USA

    N. A. Charipar, H. Kim, K. M. Charipar, S. A. Mathews & A. Piqué

  2. National Research Council Fellow at the Naval Research Laboratory, Washington, DC, 20375, USA

    E. Breckenfeld

Authors
  1. N. A. Charipar
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  2. H. Kim
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  3. E. Breckenfeld
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  4. K. M. Charipar
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  5. S. A. Mathews
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  6. A. Piqué
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Correspondence to N. A. Charipar.

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Charipar, N.A., Kim, H., Breckenfeld, E. et al. Polycrystalline VO2 thin films via femtosecond laser processing of amorphous VO x . Appl. Phys. A 122, 512 (2016). https://doi.org/10.1007/s00339-016-0034-7

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  • DOI: https://doi.org/10.1007/s00339-016-0034-7

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