Abstract
The self-organized growth of crystalline silicon nanodots and their structural characteristics are investigated. For the nanodot synthesis, thin amorphous silicon (a-Si) layers with different thicknesses have been deposited onto the ultrathin (2 nm) oxidized (111) surface of Si wafers by electron beam evaporation under ultrahigh vacuum conditions. The solid phase crystallization of the initial layer is induced by a subsequent in situ annealing step at 700 °C, which leads to the dewetting of the initial a-Si layer. This process results in the self-organized formation of highly crystalline Si nanodot islands. Scanning electron microscopy confirms that size, shape, and planar distribution of the nanodots depend on the thickness of the initial a-Si layer. Cross-sectional investigations reveal a single-crystalline structure of the nanodots. This characteristic is observed as long as the thickness of the initial a-Si layer remains under a certain threshold triggering coalescence. The underlying ultra-thin oxide is not structurally affected by the dewetting process. Furthermore, a method for the fabrication of close-packed stacks of nanodots is presented, in which each nanodot is covered by a 2 nm thick SiO2 shell. The chemical composition of these ensembles exhibits an abrupt Si/SiO2 interface with a low amount of suboxides. A minority charge carrier lifetime of 18 µs inside of the nanodots is determined.
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G. Conibeer, M. Green, R. Corkish, Y. Cho, E. Cho, C. Jiang, T. Fangsuwannarak, E. Pink, Y. Huang, T. Puzzer, T. Trupke, B. Richards, A. Shalav, K. Lin, Thin Solid Films 511/512, 654 (2006)
L. Tsakalakos, Mater. Sci. Eng., R Rep. 62, 175 (2008)
A.J. Nozik, Nano Lett. 10, 2735 (2010)
P.V. Kamat, J. Phys. Chem. C 112, 18737 (2008)
W. Shockley, H.S. Quiesser, J. Appl. Phys. 32, 510 (1961)
A.A. Cottey, J. Phys. C, Solid State Phys. 4, 1734 (1971)
T. Takagahara, K. Takeda, Phys. Rev. B 46, 15578 (1992)
E. Cho, M.A. Green, G. Conibeer, D. Song, Y. Cho, G. Scardera, S. Huang, S. Park, X. Hao, Y. Huang, L.V. Dao, Adv. Optoelectron. 2007, 1 (2007)
M.A. Green, Prog. Photovolt: Res. Appl. 9, 123 (2001)
A. Le Bris, J.F. Guillemoles, Appl. Phys. Lett. 97, 113506 (2010)
A. Pecora, L. Maiolo, G. Fortunato, C. Caligiore, J. Non-Cryst. Solids 352, 1430 (2006)
E. Yablonovitch, T. Gmitter, IEEE Electron Device Lett. 6, 597 (1985)
E. Yablonovitch, T. Gmitter, R.M. Swanson, Y.H. Kwark, Appl. Phys. Lett. 47, 1211 (1985)
A. Ghetti, Microelectron. Eng. 59, 127 (2001)
M. Zacharias, J. Heitmann, R. Scholz, U. Kahler, M. Schmidt, J. Bläsing, Appl. Phys. Lett. 80, 661 (2002)
E. Cho, S. Park, X. Hao, D. Song, G. Conibeer, S. Park, M.A. Green, Nanotechnology 19, 245201 (2008)
I. Perez-Wurfl, X. Hao, A. Gentle, D. Kim, G. Conibeer, M.A. Green, Appl. Phys. Lett. 95, 153506 (2009)
T. Matsuyama, K. Wakisaka, M. Kameda, M. Tanaka, T. Matsuoka, S. Tsuda, S. Nakano, Y. Kishi, Y. Kuwano, Jpn. J. Appl. Phys. 29, 2327 (1990)
E. Malguth, M. Roczen, O. Gref, A. Schoepke, M. Schmidt, Phys. Status Solidi A 208, 612 (2010)
Y. Wakayama, T. Tagami, S. Tanaka, Thin Solid Films 350, 300 (1999)
D.T. Danielson, D.K. Sparacin, J. Michel L.C. Kimerling, J. Appl. Phys. 100, 083507 (2006)
B. Yang, P. Zhang, D.E. Savage, M.G. Lagally, Phys. Rev. B 72, 235413 (2005)
P. Sutter, W. Ernst, Y.S. Choi, E. Sutter, Appl. Phys. Lett. 88, 141924 (2006)
B. Legrand, V. Agache, J.P. Nys, V. Senez, D. Stievenard, Appl. Phys. Lett. 76, 3271 (2000)
B. Legrand, V. Agache, T. Mélin, J.P. Nys, V. Senez, J. Appl. Phys. 91, 106 (2002)
H. Angermann, W. Henrion, M. Rebien, D. Fischer, J.T. Zettler, A. Röseler, Thin Solid Films 313/314, 552 (1998)
B. Stegemann, D. Sixtensson, T. Lussky, U. Bloeck, M. Schmidt, CHIMIA Int. J. Chem. 61, 826 (2007)
B. Stegemann, D. Sixtensson, T. Lussky, A. Schoepke, I. Didschuns, B. Rech, M. Schmidt, Nanotechnology 19, 424020 (2008)
K.J. Kim, K.T. Park, J.W. Lee, Thin Solid Films 500, 356 (2006)
P. Temple, C. Hathaway, Phys. Rev. B 7, 3685 (1973)
L. Zhen-Kun, K. Yi-Lan, H. Ming, Q. Yu, X. Han, N. Hong-Pan, Chin. Phys. Lett. 21, 403 (2004)
G. Morel, R.S. Katiyar, S.Z. Weisz, H. Jia, J. Shinar, I. Balberg, J. Appl. Phys. 78, 5120 (1995)
C. Smit, R.A.C.M.M. van Swaaijb, H. Donker, A.M.H.N. Petit, W.M.M. Kessels, M.C.M. van de Sanden, J. Appl. Phys. 94, 3582 (2003)
M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami, M. Ohwada, J. Appl. Phys. 68, 1272 (1990)
M. Roczen, E. Malguth, M. Schade, A. Schöpke, O. Gref, T. Barthel, J.A. Töfflinger, M. Schmidt, H.S. Leipner, L. Korte, B. Rech, J. Non-Cryst. Solids (2011). doi:10.1016/j.jnoncrysol.2011.11.024
B. Stegemann, L. Korte, O. Gref, T. Lussky, M. Schmidt, H. Angermann, in Proceedings of the 26th EUPVSEC (2011). doi:10.4229/26thEUPVSEC2011-2BV.3.8
S. Lombardo, S.U. Campisano, Mater. Sci. Eng., R Rep. 17, 281 (1996)
D.A. Shirley, Phys. Rev. B 5, 4709 (1972)
V.Y. Timoshenko, A.B. Petrenko, M.N. Stolyarov, T. Dittrich, W. Fuessel, J. Rappich, J. Appl. Phys. 85, 4171 (1999)
J. Wong, J.L. Huang, B. Eggleston, M.A. Green, O. Kunz, R. Evans, M. Keevers, R.J. Egan, J. Appl. Phys. 107, 123705 (2010)
Acknowledgements
The authors would like to thank Thomas Lussky, Dagmar Patzek, Kerstin Jacob, and Anja Scheu for sample preparation and technical support. The authors thank the Max Planck Institute of Microstructure Physics Halle for the access to the JEM 4010 microscope. This work was funded by the Bundesministerium für Bildung und Forschung within the joint research project SINOVA (03SF0352) and by the EU project NanoPV (FP7-NMP3-SL-2011-246331).
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Roczen, M., Schade, M., Malguth, E. et al. Structural investigations of silicon nanostructures grown by self-organized island formation for photovoltaic applications. Appl. Phys. A 108, 719–726 (2012). https://doi.org/10.1007/s00339-012-6956-9
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DOI: https://doi.org/10.1007/s00339-012-6956-9