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Nanoimprint lithography with ≤60 nm overlay precision

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Abstract

Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.

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Authors and Affiliations

  1. HP Labs, Hewlett-Packard Co., Palo Alto, CA, 94304, USA

    Wei Wu, Robert G. Walmsley, Wen-Di Li, Xuema Li & R. Stanley Williams

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  1. Wei Wu
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  2. Robert G. Walmsley
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  3. Wen-Di Li
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  4. Xuema Li
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  5. R. Stanley Williams
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Correspondence to Wei Wu.

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Wu, W., Walmsley, R.G., Li, WD. et al. Nanoimprint lithography with ≤60 nm overlay precision. Appl. Phys. A 106, 767–772 (2012). https://doi.org/10.1007/s00339-012-6775-z

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  • DOI: https://doi.org/10.1007/s00339-012-6775-z

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