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Electron beam nanofabrication of ferromagnetic nanostructures in TEM

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Abstract

Electron beam (e-beam) fabrication of nanostructures by transmission electron microscopy (TEM) is rapidly developing into a top-down nanofabrication method for the sub-5 nm fabrication of structures that cannot usually be realised using resist based lithographic techniques or by the focused ion beam patterning methods. We describe the usage of a variety of e-beam shapes, including point and elliptical line focus, as well as a comparison of LaB6 and field-emission guns (FEGs), to achieve versatile sculpting of nanodot arrays, nanobridges and nanotips. We operate our patterning on free-standing nickel (Ni) thin film laterally connected to a silicon (Si) substrate as well as to free-standing Ni nanotips, where we achieve a novel three-dimensional (3D) nano-sculpting methodology.

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Authors and Affiliations

  1. Department of Engineering Materials, University of Sheffield, Sheffield, S1 3JD, UK

    T. Gnanavel, M. A. Mat Yajid, Z. Saghi, Y. Peng, B. J. Inkson, M. R. J. Gibbs & G. Möbus

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  1. T. Gnanavel
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  2. M. A. Mat Yajid
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  3. Z. Saghi
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  4. Y. Peng
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  5. B. J. Inkson
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  6. M. R. J. Gibbs
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  7. G. Möbus
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Correspondence to T. Gnanavel.

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Gnanavel, T., Mat Yajid, M.A., Saghi, Z. et al. Electron beam nanofabrication of ferromagnetic nanostructures in TEM. Appl. Phys. A 102, 205–211 (2011). https://doi.org/10.1007/s00339-010-5953-0

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  • DOI: https://doi.org/10.1007/s00339-010-5953-0

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