Abstract
Nanoindentation testing was performed on nitrogen (N2) incorporated diamond-like carbon (N-DLC) films and deposited using radio-frequency plasma-enhanced chemical vapor deposition technique, with varied percentage of nitrogen partial pressures of 0, 44.4, 66.6, and 76.1%. The values of nanohardness (H) and elastic modulus (E) of these films were obtained from 38 to 22 GPa and 462 to 330 GPa, respectively, as the partial pressure of N2 increases from 0 to 76.1%. Further, these films were studied for % elastic recovery, ratio between residual displacement after load removal and displacement at maximum load (d res/d max ), plastic deformation energy and plasticity index parameter (H/E). Both hardness per unit stress and plasticity index per unit stress were found to be maximum at N2 partial pressure of 76.1%. X-ray photoelectron spectroscopy measurements confirmed the presence of N2 in these films.
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C. Godet, J.P. Kleider, A.S. Gudovskikh, Frequency scaling of ac hopping transport in amorphous carbon nitride. Diam. Relat. Mater. 16, 1799–1805 (2007)
F.L. Freire Jr., Amorphous hydrogenated carbon films: effect of nitrogen and fluorine incorporation on the film microstructure and mechanical properties: a review. J. Non-Cryst. Solids 304, 251–258 (2002)
A. Champi, F.C. Marques, F.L. Freire, Effect of bias voltage on the structure of carbon nitride films. Diam. Relat. Mater. 13, 1538–1542 (2004)
B. Ronning, H. Feldermann, R. Merk, H. Hofsass, Carbon nitride deposited using energetic species: A review on XPS studies. Phys. Rev. B 58, 2207–2215 (1998)
L. Jiang, A.G. Fitzgerald, M.J. Rose, R. Cheung, B. Rong, E.V. Drift, X-ray photoelectron spectroscopy studies of the effect of plasma etching on amorphous carbon nitride films. Appl. Surf. Sci. 193, 144–148 (2002)
C.A. Charitidis, Nanomechanical and nanotribological properties of carbon-based thin films. Int. J. Refract. Met. 28, 51–70 (2010)
S. Chowdhury, M.T. Laugier, I.Z. Rahman, Measurement of the mechanical properties of carbon nitride thin films from the nanoindentation loading curve. Diam. Relat. Mater. 13, 1543–1548 (2004)
J. Hao, W. Liu, Q. Xue, Effect of N2/CH4 ratio on microstructure and composition of hydrogenated carbon nitride films prepared by dual DC-RF plasma system. J. Non-Cryst. Solids 353, 136–142 (2007)
M. Lejeune, M. Benlahsen, P. Lemoine, Effect of air post contamination on mechanical properties of amorphous carbon nitride thin films. Solid State Commun. 135, 434–439 (2005)
C. Godet, G. Adamopoulos, S. Kumar, T. Katsuno, Optical and electronic properties of plasma-deposited hydrogenated amorphous carbon nitride and carbon oxide films. Thin Solid Films 482, 24–33 (2005)
H. Kinoshita, J. Takahashi, T. Hando, Formation of electrical conductive hard-carbon (DLC) films using i-C4H10/N2 supermagnetron plasma. Superf. Vacio 9, 108–110 (1999)
P. Petrov, D.B. Dimitrov, D. Papadimitriou, G. Beshkov, V. Krastev, Ch. Georgiev, Raman and X-ray photoelectron spectroscopy study of carbon nitride thin films. Appl. Surf. Sci. 151, 233–238 (1999)
T. Ono, Y. Suda, M. Akazawa, Y. Sakai, K. Suzuki, Effect of oxygen and substrate temperature on properties of amorphous carbon films fabricated by plasma-assisted pulsed laser deposition method. Jpn. J. Appl. Phys. 41, 4651–4654 (2002)
M. Sakai, Acta Metall. Mater. 41, 1751–1758 (1993)
J.F. Lin, P.J. Wei, J.C. Pan, C.F. Ai, Effect of nitrogen content at coating film and film thickness on nanohardness and Young’s modulus of hydrogenated carbon films. Diam. Relat. Mater. 13, 42–53 (2004)
A. Erdemir, C. Donnet, Tribology of diamond-like carbon films: recent progress and future prospects. J. Phys. D, Appl. Phys. 39, 311–327 (2006)
P.J. Fallon, V.S. Veerasamy, C.A. Davis, J. Robertson, G.A.J. Amaratunga, W.I. Milne, J. Koskinen, Properties of filtered-ion-beam-deposited diamond-like carbon as a function of ion energy. Phys. Rev. B 48, 4777–4782 (1993)
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Dwivedi, N., Kumar, S., Rauthan, C.M.S. et al. Nano indentation measurements on nitrogen incorporated diamond-like carbon coatings. Appl. Phys. A 102, 225–230 (2011). https://doi.org/10.1007/s00339-010-5908-5
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DOI: https://doi.org/10.1007/s00339-010-5908-5