Abstract
In this work, we present extended structural properties of poly-Si thin films fabricated by aluminium-induced crystallization (AIC) of amorphous silicon (a-Si) on high-temperature glass-ceramic substrates. The silicon nucleation kinetics on glass-ceramic substrates was investigated by optical microscopy. The crystalline quality of the films was studied by micro-Raman spectroscopy as a function of exchange annealing conditions. By means of electron backscattering diffraction (EBSD), we have analyzed the effect of thermal annealing on silicon grain size and its distribution, intra- and inter-grains defects, and on the grains preferential crystallographic orientation. The optimal thermal annealing condition, allowing 100% crystallized polysilicon large grains with an average grain size of 26 μm and 〈100〉 oriented, acquired a thermal budget of 475°C and 8 h.
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Tüzün, Ö., Slaoui, A., Maurice, C. et al. Growth kinetics and polysilicon formation by aluminium-induced crystallization on glass-ceramic substrates. Appl. Phys. A 99, 53–61 (2010). https://doi.org/10.1007/s00339-009-5506-6
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DOI: https://doi.org/10.1007/s00339-009-5506-6