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Development of Al-based multilayer optics for EUV

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Abstract

We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications.

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Authors and Affiliations

  1. Laboratoire Charles Fabry, Institut d’Optique Graduate School, 91127, Palaiseau, France

    E. Meltchakov, C. Hecquet, S. De Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill & F. Delmotte

  2. Laboratoire d’Interaction du rayonnement X avec la Matière (LIXAM), 91403, Orsay, France

    M. Roulliay

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  1. E. Meltchakov
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  2. C. Hecquet
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  3. M. Roulliay
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  4. S. De Rossi
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  5. Y. Menesguen
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  7. F. Bridou
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  9. M.-F. Ravet-Krill
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  10. F. Delmotte
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Correspondence to E. Meltchakov.

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Meltchakov, E., Hecquet, C., Roulliay, M. et al. Development of Al-based multilayer optics for EUV. Appl. Phys. A 98, 111 (2010). https://doi.org/10.1007/s00339-009-5445-2

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