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Study and characterization of W/Si and W/B4C multilayer for applications in hard X-rays mirror

  • Materials (Organic, Inorganic, Electronic, Thin Films)
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Abstract

Multilayer thin films with 2.3 nm-7.6 nm of d-spacing were deposited on fusion glass and float glass substrates by magnetron sputtering. Multilayer thin film with a lower interface roughness was deposited at an abnormal discharge region of I-V characteristic curve in DC glow discharge, compared to normal discharge region. Interface roughness of periodical multilayer in general depends on layer thickness, but in this study interface roughness was controlled by adjusting deposition conditions regardless of layer thickness. But interface roughness and X-ray reflectivity (XRR) of multilayer react sensitively to surface roughness of substrate. Multilayer thin film with 2.3 nm d-spacing shoes 42% of characteristic X-ray reflectivity(Cu Kα, λ=∼0.154 nm), while 3.6 nm d-spacing shows 80% of reflectivity. XRR, transmission electron microscope (TEM) and atomic force microscopy (AFM) were used to analyze the interface roughness (σ), surface roughness and d-spacing.

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References

  1. E. Spiller, Appl. Phys. Lett., 20, 365 (1972).

    Article  CAS  Google Scholar 

  2. Y. Jang, S. Park and K. Char, Korean J. Chem. Eng., 28(5), 1149 (2011).

    Article  CAS  Google Scholar 

  3. J. Cho, S. Kim and K. Char, Korean J. Chem. Eng., 20(1), 174 (2003).

    Article  CAS  Google Scholar 

  4. W. Chao, B. D. Harteneck, J. A. Liddle, E. H. Anderson and D. T. Attwood, Nature, 435, 1210 (2005).

    Article  CAS  Google Scholar 

  5. H. C. Kang, H. Yan, R. P. Winarski, M. V. Holt, J. Maser, C. Liu, R. Conley, S. Vogt, A. T. Macrander and G. B. Stephenson, Appl. Phys. Lett., 92, 221114 (2008).

    Article  Google Scholar 

  6. C. Michaelsen, J. Wiesmann, C. Hoffmann, K. Wulf and L. Brugemann, Proc. SPIE, 4782, 143 (2002).

    Article  Google Scholar 

  7. M. R. Schuster, H. Goebel, L. Bruegemann, D. Bahr, F. Burgaezy, C. Michaelsen, M. Stoermer, P. Ricardo, R. Dietsch, T. Holz and H. Mai, Proc. SPIE, 3767, 183 (1999)

    Article  CAS  Google Scholar 

  8. Y. S. Park, S. J. Han, J. Y. Chae, C. K. Kim and K. S. Chon, Proc. SPIE, 7258, 72583L (2009).

    Google Scholar 

  9. C. P. Jensen, K. K. Madsen and F. E. Christensen, Exp. Astron., 20, 93 (2005).

    Article  Google Scholar 

  10. V. Cotroneo, R. Bruni, P. Gorenstein, G. Pareschi and S. Romaine, Proc. SPIE, 7437, 74371Q (2009).

    Google Scholar 

  11. T. Salditt, D. Lott, T. H. Metzger, J. Peisl, G. Vignaud, P. Hoghoj, O. Scharpf, P. Hinze and R. Lauer, Phys. Rev. B, 54, 5860 (1996).

    Article  CAS  Google Scholar 

  12. E. E. Fullerton, J. Pearson, C. H. Sawers, S. D. Bader, X. Z. Wu and S. K. Sinha, Phys. Rev. B, 48, 17 432 (1993).

    Article  Google Scholar 

  13. S. P. Vernon, D. G. Stearns and R. S. Rosen, Appl. Opt., 32, 6969 (1993).

    Article  CAS  Google Scholar 

  14. A. C. Thompson, J. Kirz, D. T. Attwood, E. M. Gullikson, M. R. Howells, J. B. Kortright, Y. Liu and A. L. Robinson, X-ray data booklet, 3rd Ed., Lawrence Berkeley National Laboratory, Berkeley, California (2009).

    Google Scholar 

  15. C. Braun, Parratt32 Fitting routine for reflectivity data, HMI, Berlin (1997).

    Google Scholar 

  16. L. G. Parratt, Phys. Rev., 95(2), 359 (1954).

    Article  Google Scholar 

  17. D. Bahr and W. Press, Phys. Rev. B, 47, 4385 (1993).

    Article  CAS  Google Scholar 

  18. L. Névot and P. Croce, Rev. Phys. Appl., 15, 761 (1980).

    Article  Google Scholar 

  19. S. K. Sinha, E. B. Sirota and S. Garoff, Phys. Rev., 38, 2297 (1988).

    Article  Google Scholar 

  20. A. Grill, Cold Plasma in Materials Fabrication: From Fundamentals to Applications, Wiley, New York (1994).

    Book  Google Scholar 

  21. M. Chládek, V. Valvoda, C. Dorner, C. Holý and J. Grim, Appl. Phys. Lett., 69, 1318 (1996).

    Article  Google Scholar 

  22. V. Holý, J. Kubena, W. W. van den Hoogenhof and I. Vávra, Appl. Phys. A, 60, 93 (1995).

    Article  Google Scholar 

  23. G. S. Elliot, A. D. Gromko, F. V. Veegaete, C. D. Johnson and D. C. Johnson, Phys. Rev. B, 58, 8805 (1998).

    Article  Google Scholar 

  24. H. J. Voorma, E. Louis, N. B. Koster and F. Bijkerk, J. Appl. Phys., 83, 4700 (1998).

    Article  CAS  Google Scholar 

  25. M. B. Stearns, C. H. Chang and D. G. Stearns, J. Appl. Phys., 71, 187 (1992).

    Article  CAS  Google Scholar 

  26. D. L. Windt, R. Hull and W. K. Waskiewick, J. Appl. Phys., 71, 2675 (1992).

    Article  CAS  Google Scholar 

  27. A. Paul and G. S. Lodha, Phys. Rev. B, 65, 245416 (2002).

    Article  Google Scholar 

  28. D. L. Windt, S. Donguy, C. J. Hailey, J. Koglin, V. Honkimaki, E. Ziegler, F. E. Christensen, C. M. Hubert Chen, F. A. Harrison and W. W. Craig, Proc. SPIE, 4851, 639 (2003).

    Article  CAS  Google Scholar 

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Authors and Affiliations

  1. Research Center, Hanwha L&C, Sinseong-dong, Yuseong-gu, Daejeon-si, 305-804, Korea

    Chang Kyu Kim, Young Sei Park, Sei Jin Han & Jang yool Chae

  2. Department of Chemical Engineering, Chungbuk National University, 52, Naesudong-ro, Heungduk-gu, Cheongju, Chungbuk, 362-763, Korea

    Chang Kyu Kim & Byung-Ki Na

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  1. Chang Kyu Kim
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  2. Young Sei Park
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  3. Sei Jin Han
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  4. Jang yool Chae
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Correspondence to Byung-Ki Na.

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Kim, C.K., Park, Y.S., Han, S.J. et al. Study and characterization of W/Si and W/B4C multilayer for applications in hard X-rays mirror. Korean J. Chem. Eng. 32, 2124–2132 (2015). https://doi.org/10.1007/s11814-015-0068-0

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  • DOI: https://doi.org/10.1007/s11814-015-0068-0

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