Local crystallization in an oxyfluoride glass doped with Er³⁺ ions using a continuous argon laser

Abstract

Local crystalline formation in erbium doped oxyfluoride glass has been obtained under a cw Argon laser irradiation up to 1.8 W pumping power. By exciting at 514 nm, the emission from 800 nm and 850 nm corresponding to the ⁴S_3/2(²H_11/2)→⁴I_13/2 electronic transitions have been analyzed both inside and outside the irradiated area. The changes in the emission spectra indicate that the high power Ar laser irradiation has resulted in a localized desvitrification process. The temperature dependence of the fluorescence intensity ratio of the 800 nm and 850 nm emission bands has been used to determine the temperature of the irradiated zone. Moreover, the average lifetime of the ⁴S_3/2(²H_11/2) thermalized levels have been measured as a function of the excitation spot position. An important decrease is observed at the irradiated area. These results confirm that a localized cristalline phase has been created by the laser action.