Abstract
Ultra-thin films of para-hexaphenyl (6P) were prepared on potassium chloride(001) utilising physical vapour deposition under well-defined ultra-high-vacuum conditions. The 6P growth characteristics were studied as a function of substrate temperature. For this purpose, in situ X-ray photoelectron spectroscopy (XPS) in combination with thermal desorption spectroscopy (TDS) was applied to reveal the kinetics of the layer growth. Ex situ atomic force microscopy (AFM) was used to determine the film morphology. At the initial growth stage the film grows in the form of needle-like islands with a high aspect ratio and, subsequently, when a certain coverage is reached, terraced mounds of 6P are formed. It is shown that this ‘certain coverage’ strongly depends on the substrate temperature and that the morphology of the film can be tailored easily by changing the surface temperature. Combined XPS and TDS investigations were carried out to obtain information on the stability of these films. It is shown that films grown at low temperature (90 K) rearrange during heating and this rearrangement could also be made visible by AFM.
Similar content being viewed by others
References
G. Leising, S. Tasch, F. Meghdadi, L. Athouel, G. Froyer, U. Scherf, Synth. Met. 81, 185 (1996)
W. Graupner, G. Grem, F. Meghdadi, C. Paar, G. Leising, U. Scherf, K. Mullen, W. Fischer, F. Stelzer, Mol. Cryst. Liq. Cryst. 256, 549 (1994)
F. Meghdadi, S. Tasch, B. Winkler, W. Fischer, F. Stelzer, G. Leising, Synth. Met. 85, 1441 (1997)
H. Yanagi, S. Okamoto, T. Mikami, Synth. Met. 91, 91 (1997)
G. Leising, S. Tasch, W. Graupner, Handbook of Conducting Polymers: Fundamentals of Electroluminescence in Paraphenylene-type Conjugated Polymers and Oligomers, 2nd edn. (Marcel Dekker, New York, 1997)
D.J. Gundlach, Y.-Y. Lin, T.N. Jackson, D.G. Schlom, Appl. Phys. Lett. 7, 3853 (1997)
S. Tasch, C. Brandstätter, F. Meghdadi, G. Leising, G. Froyer, L. Athouel, Adv. Mater. 9, 33 (1997)
G. Meinhardt, W. Graupner, G. Feistritzer, R. Schröder, E.J.W. List, A. Pogantsch, G. Dicker, B. Schlicke, N. Schulte, A.D. Schluter, G. Winter, M. Hanack, U. Scherf, K. Müllen, G. Leising, Proc. SPIE 3623, 46 (1999)
T. Mikami, H. Yanagi, Appl. Phys. Lett. 73, 563 (1998)
H. Yanagi, S. Okamoto, Appl. Phys. Lett. 71, 2565 (1997)
R. Resel, Thin Solid Films 433, 1 (2003)
C. Teichert, G. Hlawacek, A. Andreev, H. Sitter, P. Frank, A. Winkler, N.S. Sariciftci, Appl. Phys. A 82, 665 (2006)
H. Yanagi, T. Morikawa, Appl. Phys. Lett. 75, 187 (1999)
Y. Yoshida, H. Takiguchi, T. Hanada, A. Tanigaki, E.M. Han, K. Yase, J. Cryst. Growth 198–199, 923 (1999)
D.M. Smilgies, N. Boudet, H. Yanagi, Appl. Surf. Sci. 189, 24 (2002)
E.J. Kinztel Jr., D.M. Smilgies, J.G. Sofronik, S.A. Safron, D.H. Van Winkle, J. Vac. Sci. Technol. A 22, 107 (2004)
F. Balzer, H.G. Rubahn, Surf. Sci. 548, 170 (2004)
P. Frank, G. Hernandez-Sosa, H. Sitter, A. Winkler, Thin Solid Films, accepted
T. Haber, A. Andreev, A. Thierry, H. Sitter, M. Oehzelt, R. Resel, J. Cryst. Growth 284, 209 (2005)
T. Haber, M. Oehzelt, R. Resel, A. Andreev, A. Thierry, H. Sitter, D.M. Smilgies, B. Schaffer, W. Grogger, J. Nanosci. Nanotechnol. 6, 1 (2006)
A. Andreev, A. Montaigne, G. Hlawacek, H. Sitter, C. Teichert, J. Vac. Sci. Technol. A 24, 1660 (2006)
T. Haber, R. Resel, A. Andreev, M. Oehzelt, D.M. Smilgies, H. Sitter, submitted to J. Cryst. Growth Des.
S. Müllegger, O. Stranik, E. Zojer, A. Winkler, Appl. Surf. Sci. 221, 184 (2004)
A. Andreev, T. Haber, D.M. Smilgies, R. Resel, H. Sitter, N.S. Sariciftci, L. Valek, J. Cryst. Growth 275, 2037 (2005)
S. Müllegger, A. Winkler, Surf. Sci. 600, 1290 (2006)
P. Frank, G. Hlawacek, O. Lengyel, A. Satka, C. Teichert, R. Resel, A. Winkler, Surf. Sci. 601, 2152 (2007)
T. Haber, S. Müllegger, A. Winkler, R. Resel, Phys. Rev. B 74, 045419 (2006)
Author information
Authors and Affiliations
Corresponding author
Additional information
PACS
81.07.Nb; 81.10.Bk; 81.16.Dn; 68.37.Ps
Rights and permissions
About this article
Cite this article
Frank, P., Winkler, A. Tailoring the film morphology of para-hexaphenyl on KCl(001) by surface temperature. Appl. Phys. A 90, 717–721 (2008). https://doi.org/10.1007/s00339-007-4339-4
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00339-007-4339-4