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Selective tungsten deposition into ordered nanohole arrays of anodic porous alumina by electron-beam-induced deposition

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Abstract

The selective deposition of a metal (tungsten) into ordered nanohole arrays of an anodic porous alumina membrane was performed using an electron-beam-induced deposition process. After deposition, the membrane was observed and analyzed using electron microscopy and energy-dispersive X-ray spectroscopy. It is shown that the deposition was preferentially conducted in the holes in the irradiated area of the electron beam. A calculation of the electron-beam intensity explains the reason for the preferential deposition in the holes.

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Authors and Affiliations

  1. Nanomaterials Laboratory, National Institute for Materials Science, 3-13 Sakura, Tsukuba, 305-0003, Japan

    G.Q. Xie, M. Song, K. Mitsuishi & K. Furuya

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  1. G.Q. Xie
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  2. M. Song
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  3. K. Mitsuishi
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  4. K. Furuya
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Correspondence to G.Q. Xie.

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PACS

81.07.-b; 81.16.Rf; 61.46.+w

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Xie, G., Song, M., Mitsuishi, K. et al. Selective tungsten deposition into ordered nanohole arrays of anodic porous alumina by electron-beam-induced deposition. Appl. Phys. A 79, 1843–1846 (2004). https://doi.org/10.1007/s00339-004-2926-1

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  • DOI: https://doi.org/10.1007/s00339-004-2926-1

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