Abstract
We propose and experimentally demonstrate a fluorescent imaging technique for surface quality control of wet-cleaned silicon wafers. This simple technique allows submicron resolution and fast scanning, while it reveals significant information about water stains distribution. Distribution of water stains is measured using this novel technique and correlated to the surface structure.
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33.50.-j; 42.62.Cf; 61.72.Qq; 81.65.Cf
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Yakovlev, V., Mikhaylichenko, K. & Ravkin, M. Novel optical technique for microscopic imaging of water stains. Appl. Phys. A 80, 309–311 (2005). https://doi.org/10.1007/s00339-003-2181-x
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DOI: https://doi.org/10.1007/s00339-003-2181-x