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Effects of the azimuthal orientation on glancing angle deposited nanostructured surfaces for enhanced boiling heat transfer

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Abstract

Silicon oxide (SiO) coated nanostructured surfaces for nucleate pool boiling heat transfer are experimentally studied. The 300 nm thickness SiO nanostructured coating over SiO intermediate layer (100 nm thickness thin film) is evolved with three different azimuthal orientations of 55°, 70° and 85° (vapor incident angle) on three separate copper heating surfaces by Glancing Angle Deposition (GLAD) technique. 300 nm thickness nanostructured coating without intermediate layer is synthesized on another copper heating surface at azimuthal orientation of 85° by applying same technique. Additionally, 300 nm thickness SiO thin film on one copper surface is fabricated with E-beam method and without GLAD technique. The surfaces are characterized by Field Emission - Scanning Electron Microscopy and Atomic Force Microscope measurement to analyze the surface cavity, roughness and effective heating surface area. The pool boiling experiments are performed on these surfaces including uncoated one at saturation temperature of 6º C. Refrigerant R-134a is used as boiling liquid. The SiO nanostructured surface with intermediate layer of TF provides higher heat transfer activities than that of without intermediate layer. The modified surface at 85º GLAD significantly enhanced boiling heat transfer performance compared to 55º GLAD, 70º GLAD and uncoated surface. The studies of Field Emission - Scanning Electron Microscopy confirmed that the successfully and uniformly distributed SiO nanostructure formed via 85º GLAD. The nanofabrication with 85º GLAD over intermediate layer is an approach that provides the ability of producing a well aligned and well separated nanostructure on a surface for enhanced boiling heat transfer. This simple and cost-effective surface modification technique can alter thermodynamic performance of surface, especially in case of energy conversion devices to reduce energy dissipation.

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Availability of data and materials

The datasets used and/or analysed during the current study are available from the corresponding author on reasonable request.

Abbreviations

A:

Surface area, [m2]

A1, A2, A3, A4, A5, A6  and AS :

Area calculated from vertically oriented heater at Sect. 1, 2, 3, 4, 5, 6 and S, [m2]

D1, D2, D3, D4, D5, D6and DS :

Diameter measured from vertically oriented heater section at point 1, 2, 3, 4, 5, 6 and S, [m]

h:

Heat transfer coefficient, [W.m−2.K−1]

I:

Current, [amp]

k:

Thermal conductivity,[W m−1.K−1]

M:

Molecular weight

\(\mathrm{P}\) :

Pressure

\({\mathrm{P}}_{\mathrm{c}}\) :

Critical pressure

\({\mathrm{P}}_{\mathrm{r}}\) :

Reduced pressure, (P/Pc)

Q:

Power input, [W]

q:

Heat flux, [W.m−2]

q1, q2, q3, q4, q5, q6  and qS :

Heat flux calculated from vertically oriented heater at sectional area A1, A2, A3, A4, A5, A6 and AS, [W.m−2]

\({\mathrm{R}}_{\mathrm{a}}\) :

Arithmetic mean roughness height, [\(\mathrm{\mu m}]\)

T:

Temperature, [\(K\)]

T1, T2, T3, T4, T5, T6, TS :

Temperature measured from heater Section in horizontal direction, [\(\mathrm{K}\)]

V:

Voltage, [volt]

∆ :

Difference

α:

Evaporation incident angle / Azimuthal orientation

AFM:

Atomic Force Microscope

DI:

Deionized;

EBE:

E-Beam Evaporator

EBPD:

Electron Beam Physical Vapor Deposition

EPE:

Expanded Poly-Ethylene

FE-SEM:

Field Emission - Scanning Electron Microscopy

GLAD:

Glancing Angle Deposition

HTC:

Heat Transfer Coefficient

nm:

Nanometer

SiO:

Silicon oxide

TF:

Thin Film

b:

Boiling

cu:

Copper

ref:

Reference

s:

Surface

R:

Ratio

sat:

Saturation

w:

Wall

ER:

Enhancement Ratio

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Acknowledgements

The authors gratefully acknowledge to SAIF, IIT Mumbai, India for providing the FE-SEM facility and NIT Agartala, India for preparation of SiO particles coatings along with characterization of the test surfaces by AFM and different experimental works.

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Authors and Affiliations

  1. Assistant Engineer, Mechanical Division, Public Works Department, Government of Tripura, Agartala-799001, India

    Mukul Ray

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  1. Mukul Ray
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Highlights

• Study is primarily focusing on nucleate boiling and performed the boiling experiment at the saturation condition

• Nanostructured film was evolved by 55º, 70º and 85º GLAD azimuthal orientations

• SiO nanostructured film was fabricated with and without SiO intermediate TF layer

• R-134a was boiled on all nanostructured surfaces at pool temperature 6 ºC

• Boiling results show that 85º GLAD surface gives maximum HTC

• Nanostructured film with intermediate layer performed better durability

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Ray, M. Effects of the azimuthal orientation on glancing angle deposited nanostructured surfaces for enhanced boiling heat transfer. Heat Mass Transfer 58, 1679–1694 (2022). https://doi.org/10.1007/s00231-022-03208-z

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  • DOI: https://doi.org/10.1007/s00231-022-03208-z

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