Abstract
A method for determining plasma power in rf-GDOES is presented. It is based on an effective resistance located in the inductive coil of the impedance matching. The amount of electrical power consumed in the matching system depends on the capacitive current flowing through the matching system, which depends on the applied voltage, the stray capacity, and the frequency. This correction method is experimentally evaluated and compared with the integral plasma power calculation.
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Nelis, T., Aeberhard, M., Rohr, L. et al. A simple method for measuring plasma power in rf-GDOES instruments. Anal Bioanal Chem 389, 763–767 (2007). https://doi.org/10.1007/s00216-007-1509-3
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DOI: https://doi.org/10.1007/s00216-007-1509-3