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Substrate temperature estimation and control in advanced MOCVD process for superconductor manufacturing

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Abstract

The estimation and control of the substrate temperature in the Metal Organic Chemical Vapor Deposition (MOCVD) of superconductor tape manufacturing is investigated. In the advanced MOCVD (AMOCVD) for High-Temperature Superconductor (HTS) tape manufacturing developed at the University of Houston, Ohmic resistance heating is implemented to heat the rolling tape at a reference temperature. Control of the electric current through the tape is proposed to ensure substrate temperature uniformity that is essential for reducing nanoscale defect growth. The substrate temperature measurement is corrupted by the continuous deposition of precursor gas material on the crystal rods of the pyrometers in the reaction chamber challenging the real-time control process. The proposed approach for model-based substrate temperature control is based on the real-time estimation of the states of the substrate temperature model dynamics, and the sensor drift and drift rate, using an extended Kalman filter (EKF) combined with particle swarm optimization (PSO) to optimally tune the process and measurement noise covariance matrices. Experimental data from the AMOCVD facility are used to validate the model parameter and the sensor drift estimation process. The estimated temperature is used in a simulation study of a PSO-tuned LQR controller with adjustable gains designed to ensure uniform heating along the tape by controlling the electric current, and the results are compared with those of a PI controller. Precise temperature regulation in Ohmic heating is critical within a multitude of manufacturing and material processes, and the proposed methods constitute a systematic framework for model-based temperature estimation and control.

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Acknowledgements

We gratefully acknowledge the assistance of University of Houston graduate students Siwei Chen and Chirag Goel in sharing their expert knowledge on the AMOCVD superconductor manufacturing process and experimental data. We also gratefully acknowledge financial support from the Advanced Manufacturing Institute (AMI) at the University of Houston.

Funding

This research was supported by the University of Houston Advanced Manufacturing Institute.

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Authors and Affiliations

  1. Department of Mechanical Engineering, University of Houston, Houston, 77204, TX, USA

    Amal Chebbi, Karolos Grigoriadis, Matthew Franchek & Marzia Cescon

  2. Advanced Manufacturing Institute, University of Houston, Houston, 77204, TX, USA

    Karolos Grigoriadis, Matthew Franchek & Marzia Cescon

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  1. Amal Chebbi
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  2. Karolos Grigoriadis
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Contributions

Amal chebbi: data analysis, investigation, method proposed, simulations, writing, review and editing. Karolos Grigoriadis: investigation, writing, review and editing. Matthew Franchek: investigation, review and editing. Marzia Cescon: review and editing.

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Correspondence to Amal Chebbi.

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Chebbi, A., Grigoriadis, K., Franchek, M. et al. Substrate temperature estimation and control in advanced MOCVD process for superconductor manufacturing. Int J Adv Manuf Technol (2024). https://doi.org/10.1007/s00170-024-13699-1

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