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Adaptive polishing path optimization for free-form uniform polishing based on footprint evolution

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Abstract

Polishing path optimization plays a crucial role in achieving high-quality and uniform surface polishing of free-form surfaces. To address the issue of uncontrollable ripple errors caused by uneven material removal in traditional contact polishing, this paper proposes an adaptive polishing path optimization method for uniform polishing of free-form surfaces based on footprint evolution. The presented approach considers the influence of curvature on footprint evolution and seeks to dynamically optimize the spacing between adjacent paths. This optimization ensures suitable overlap between neighboring footprints, ultimately leading to the achievement of uniform depth removal. Through modeling simulations and experimental comparisons involving different contact curvatures, it has been conclusively established that surface curvature plays a pivotal role in footprint evolution. Additionally, surface polishing experiments yielded results indicating a reduction in surface waviness within the central polishing area, decreasing from a root-mean-square value of 5.1766 to 4.1448 nm. These outcomes preliminary demonstrate the effectiveness of the proposed method. This study presents an efficient curvature adaptive path planning approach based on footprint evolution, offering new insights into achieving uniform polishing and suppressing waviness errors on free-form surfaces.

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Acknowledgements

This research was supported by supported by the National Key Research and Development Program of China (No. 2022YFB3403600) and the Natural Science Foundation of China (No. 51991371, 52235004, and 52005463) and the Natural Science Foundation of Sichuan Province (No. 2023NSFSC0026 and No. 2023NSFSC1988). This work was also supported by the Fundamental Research Funds for the Central Universities (No. 2682023GF025).

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Authors and Affiliations

  1. School of Mechanical Engineering, Southwest Jiaotong University, Chengdu, 610031, China

    Yanjun Han, Chong Wang, Haiyang Zhang, Menghuan Yu, Xunchuan Chang & Jie Dong

  2. Sichuan Precision and Ultra-Precision Machining Engineering Technology Center, Chengdu, 610200, China

    Yunfei Zhang

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  1. Yanjun Han
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  2. Chong Wang
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  4. Menghuan Yu
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Contributions

Yanjun Han: conceptualization; investigation; methodology; resources; validation; writing—review and editing; funding; project administration; supervision. Chong Wang: investigation, methodology, data curation, data formal analysis, writing (original draft). Haiyang Zhang: methodology, data curation, visualization, writing (original draft). Menghuan Yu: methodology; data curation; visualization; validation; writing—review and editing. Xunchuan Chang: data formal analysis, data curation, writing (review and editing). Jie Dong: data curation, visualization. Yunfei Zhang: resources, funding, writing (review & editing).

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Correspondence to Yanjun Han or Yunfei Zhang.

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Han, Y., Wang, C., Zhang, H. et al. Adaptive polishing path optimization for free-form uniform polishing based on footprint evolution. Int J Adv Manuf Technol 130, 4311–4324 (2024). https://doi.org/10.1007/s00170-024-12996-z

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  • DOI: https://doi.org/10.1007/s00170-024-12996-z

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