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1 Correction to: The International Journal of Advanced Manufacturing Technology https://doi.org/10.1007/s00170-022-09770-4
The original article contained a mistake.
In the originally published paper, the acknowledgements are wrong. Two funding funds have been repeated (Guizhou University cultivation project (Guida cultivation [2020] No. 10), and Guizhou University cultivation project (Guida cultivation [2020] No. 10)). The acknowledgement is now correctly shown below:
Acknowledgements: The authors would like to appreciate the Natural Science Foundation of China (52105178, 12162008), Natural Science Foundation of Hunan (2022JJ40056), and Guizhou University cultivation project (Guida cultivation [2020] No. 10).
The original article has been corrected.
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Meng, X., Yue, H., Wu, W. et al. Correction to: Simulation of abrasive polishing process of single crystal silicon based on molecular dynamics. Int J Adv Manuf Technol 121, 7213 (2022). https://doi.org/10.1007/s00170-022-09853-2
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DOI: https://doi.org/10.1007/s00170-022-09853-2