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Investigation the complex dynamic evolvement mechanism of particle cluster and surface integrity in the chemical mechanical planarization

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Abstract

The surface planarization in the chemical mechanical planarization is mainly realized by the mechanical effect which depends on the micro-tribology behavior of nanoparticles. The material removal rate is decreased and micro-scratch is generated in the wafer surface due to the agglomeration of particles. The slurry particles hold definite energy level and microstructure which makes the classical materials processing theory unable to give reasonable explanation about this process. Large-scale classical molecular dynamic simulation of interaction among nanoparticles and solid surface has been carried out to investigate the evolvement mechanism of particle cluster and surface planarization. It is showed that the particle aggregation behavior is a size-dependent process because of the high ratio of surface atoms to bulk atoms which leads to the active reactivity and catalytic activity of nanoparticles. The substrate materials (nanoparticle) become transforming from low-energy stable system to high-energy unstable system after the two-body collision which is favorable for aggregation process. There exists obvious geometry boundary between the particle elements in the large aggregates and only the dendritic aggregates formed. The larger particles have definite microstructure and additional internal degree of freedom which can be used to take up, store, and transfer energy, thus lower the activity of chemical reaction which weaken the particle aggregation process.

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Authors and Affiliations

  1. School of Mechanical Engineering, Tianjin University, Tianjin, 300072, People’s Republic of China

    Xuesong Han

  2. Department of Mechanical, Industrial and Manufacturing Engineering, The University of Toledo, Toledo, OH, 43606, USA

    Yong X. Gan

Authors
  1. Xuesong Han
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  2. Yong X. Gan
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Correspondence to Xuesong Han.

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Han, X., Gan, Y.X. Investigation the complex dynamic evolvement mechanism of particle cluster and surface integrity in the chemical mechanical planarization. Int J Adv Manuf Technol 64, 13–22 (2013). https://doi.org/10.1007/s00170-012-3996-4

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  • DOI: https://doi.org/10.1007/s00170-012-3996-4

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