Skip to main content
SpringerLink
Log in

Morphology and deposition rates of TiB2 prepared by chemical vapour deposition of TiCl4 + B2H6 system

  • Papers
  • Published:
Journal of Materials Science Aims and scope Submit manuscript

Abstract

Titanium diboride (TiB2) deposits were obtained on a graphite substrate by chemical vapour deposition using TiCl4, B2H6 and H2 at deposition temperatures (Tdep) of 1323 to 1773 K and total gas pressures (Ptot) of 4 to 40 kPa. B/Ti molar ratio in the source gases [2B2H6/TiCl4(mB/Ti)] was varied from 0.6 to 4. TiB2 plates were prepared at mB/Ti = 0.6 to 2. The deposition rate increased with increasing Tdep. The largest value of the deposition rate was 1.4 × 10−7 m sec−1 (0.5 mmh−1) at Tdep = 1773 K, Ptot =40 kPa and mB/Ti = 0.6. The activation energies for the formation of CVD−TiB2 plate were 41 to 51 kJ mol−1. These values suggest that the diffusion of gaseous species through the boundary layer is a rate-determining process.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. G. AUNER, Y. F. HSIEH and K. R. PADMANABHAN, Thin Solid Films 107 (1983) 191.

    Article  Google Scholar 

  2. H. O. PIERSON, in “Chemically Vapor Deposited Coatings”, edited by H. O. Pierson (American Ceramic Society, Chicago, 1981) p. 27.

    Google Scholar 

  3. A. J. BECKER and J. H. BLANKS, Thin Solid Films 119 (1984) 241.

    Article  Google Scholar 

  4. T. M. BESMANN and K. E. SPEAR, J. Cryst. Growth 31 (1985) 60.

    Article  Google Scholar 

  5. H. O. PIERSON and D. M. MATTOX, J. Less-Common Met. 67 (1979) 381.

    Article  Google Scholar 

  6. L. R. SHAPPIRIO and J. J. FINNEGAN, Thin Solid Films 107 (1983) 81.

    Article  Google Scholar 

  7. R. E. GANNON, R. C. FOLWEILER and T. VASILOS, J. Amer. Ceram. Soc. 46 (1963) 496.

    Article  Google Scholar 

  8. J. J. GEBHARDT and R. F. CREE, J. Amer. Ceram. Soc. 48 (1965) 262.

    Article  Google Scholar 

  9. H. O. PIERSON and E. RANDICH, in “Proceedings of the 6th International Conference on Chemical Vapor Deposition, Atlanta, October 1977”, edited by L. F. Donaghey, P. Rai-Choudhury and R. N. Tauber (Electrochemical Society, Princeton, 1977) p. 304.

    Google Scholar 

  10. K. MOERS, Z. Anorg. Allg. Chem. 198 (1931) 243.

    Google Scholar 

  11. T. TAKAHASHI and H. KAMIYA, J. Cryst. Growth 26 (1974) 203.

    Article  Google Scholar 

  12. T. TAKAHASHI and H. ITOH, J. Cryst. Growth 49 (1980) 445.

    Article  Google Scholar 

  13. G. BLANDENET, Y. LAGARDE, J. P. MORLEVAY and G. UNY, in Proceedings of the 6th International Conference on Chemical Vapor Deposition, Atlanta, October 1977, edited by L. F. Donaghey, P. Rai-Choudhury and R. N. Tauber (Electrochemical Society, Princeton, 1977) p. 330.

    Google Scholar 

  14. H. O. PIERSON and A. W. MULLENDORE, Thin Solid Films 95 (1982) 99.

    Article  Google Scholar 

  15. A. J. CAPUTO, W. J. LACKEY, I. G. WRIGH and P. ANGELINI, J. Electrochem. Soc. 132 (1985) 2274.

    Article  Google Scholar 

  16. T. M. BESMANN and K. E. SPEAR, J. Electrochem. Soc. 124 (1977) 786.

    Article  Google Scholar 

  17. Idem, ibid. 124 (1977) 790.

    Article  Google Scholar 

  18. H. O. PIERSON and A. W. MULLENDORE, Thin Solid Films 72 (1980) 511.

    Article  Google Scholar 

  19. T. M. BESMANN, ORNL/TM-5775 (April, 1977).

  20. “JANAF Thermochemical Tables, 2nd edn, No. NSRDS-NBS-37”, edited by D. R. Stull and H. Prophet, U.S. Government Printing Office, Washington, DC (1971).

    Google Scholar 

  21. I. BARIN, O. KNACKE, and O. KUBASCHEWSKI, “Thermochemical Properties of Inorganic Substances”, Supplement (Springer-Verlag, Berlin, Heidelberg, New York, Verlag Stahleisen m.b.H. Düsseldorf, 1977).

    Book  Google Scholar 

  22. E. RANDICH, Thin Solid Films 63 (1979) 309.

    Article  Google Scholar 

  23. A. W. MULLENDORE, J. B. WHITLEY, H. O. PIERSON and D. M. MATTOX, J. Vac. Sci. Technol. 18 (1981) 1049.

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Institute for Materials Research, Tohoku University, Sendai, 980, Japan

    Masakazu Mukaida, Takashi Goto & Toshio Hirai

Authors
  1. Masakazu Mukaida
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Takashi Goto
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Toshio Hirai
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Mukaida, M., Goto, T. & Hirai, T. Morphology and deposition rates of TiB2 prepared by chemical vapour deposition of TiCl4 + B2H6 system. J Mater Sci 25, 1069–1075 (1990). https://doi.org/10.1007/BF03372205

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF03372205

Keywords

Search

Navigation