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MOCVD Technology

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Abstract

This paper examines the potentials and developmental status of metal organic chemical vapor deposition (MOCVD) as a commercial thin film deposition technique. Reactor design, deposit purity and uniformity characteristies are discussed with regard to scale-up. Critical process parameters and process contaminants are also reviewed.

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Authors
  1. N. E. Schumaker
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  2. R. A. Stall
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  3. W. R. Wagner
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  4. L. G. Polgar
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Additional information

N.E. Schumaker received his Ph.D. in physical chemistry from MIT. He is currently President and Chief Executive Officer of EMCORE in South Plainfield, New Jersey.

R.A. Stall received his Ph.D. in electrical engineering from Cornell. He is currently Vice President of Materials at EMCORE.

W.R. Wagner received his Ph.D. in materials science from Cornell. He is currently Vice President of Systems at EMCORE.

L.G. Polgar received his Ph.D. in solid state physics from Carnegie-Mellon University. He is currently Vice President of Marketing and Sales at EMCORE.

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Schumaker, N.E., Stall, R.A., Wagner, W.R. et al. MOCVD Technology. JOM 38, 41–45 (1986). https://doi.org/10.1007/BF03257817

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  • DOI: https://doi.org/10.1007/BF03257817

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