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Microstructure controlling of Ti/N particles dissipated energy to superficial layer of titanium nitride film

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Chinese Science Bulletin

Abstract

The titanium nitride (TiNx) thin film with a controllable surface structure was fabricated by the dc-reactive magnetron sputtering technique, and the variation of microstructure in the surface layer with the energy of condensed adatom was investigated through X-ray diffraction (XRD) pattern and transmission electron microscope (TEM). It was found that the lattice parameters and the full width at half maximum (fwhm) of XRD peak on the top layers in the preferred orientation of (111) and (002) were closely correlated to the impacting induced phase composition, compressive strain, crystallite size and the fault density of the thin films. In the theory, a new means was used to model the atomistic process of per condensed adatom. The average energy at least in the minimum energy state of the incorporate adatom on TiN surface layer was statistically formulized through a careful consideration of dynamical process, which properly interpreted the experimental observations.

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Authors and Affiliations

  1. Department of Physics, Shanghai University, 200436, Shanghai, China

    Zhongquan Ma

  2. Department of Chemistry, Shanghai University, 200436, Shanghai, China

    Qin Zhang

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  1. Zhongquan Ma
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  2. Qin Zhang
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Correspondence to Zhongquan Ma.

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Ma, Z., Zhang, Q. Microstructure controlling of Ti/N particles dissipated energy to superficial layer of titanium nitride film. Chin.Sci.Bull. 49, 230–234 (2004). https://doi.org/10.1007/BF03182803

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  • DOI: https://doi.org/10.1007/BF03182803

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