Abstract
Indium alloyed to n-type CdTe of about 1016 cm-3 electron concentration provides a contact resistivity of about 7 x 10-3 ohm cm2. This is achieved by alloying for 10 minutes at 150-450‡C in a sealed ampoule with an overpressure of cadmium. If the alloying is done in an open tube H2 flow without a Cd vapor overpressure, alloying temperatures above 250‡C cause the contact resistance to rise as cadmium vacancies increase the compensation in the CdTe. Further improvement of the contact resistivity to 1 x 10-3 ohm cm is obtained by a 900‡C diffusion of In into the n-CdTe (electron concentration 1016 cm-3 before the diffusion).
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T. C. Anthony, A. L. Fahrenbruch, and R. H. Bube, J. Electron. Mater,11, 89 (1982).
H. Tews and C. An, J. Appl. Phys. 53, 5339 (1982).
A. Musa, J. P. Ponpon, J. J. Grob, M. Hage-Ali, R. Stuck and P. Siffert, J. Appl. Phys.54, 3260 (1983).
C.-T. Lee and R. H. Bube, J. Appl. Phys. 54, 7041 (1983).
J. Gu, T. Kitahara, K. Kawakam and T. Sakaguchi, J. Appl. Phys.46, 1184 (1975).
E. Janik and R. Triboulet, J. Phys. D.16, 2333 (1983).
R. E. Braithwaite, C. G. Scott, and J. B. Mullin, Solid-State Electron.23, 1091 (1980).
D. DeNobel, “Method of making electrical connection to semiconductive selenide or telluride,” U.S. Patent Office, 2865793 (1958).
P. Gaugash and A. G. Milnes, J. Electrochem. Soc.128, 924 (1981).
M. H. Patterson and R. H. Williams, J. Phys. D.11, L83 (1978).
L. C. Isett and P. K. Raychaudhuri, J. Appl. Phys.55, 3605–3612 (1984).
A. L. Fahrenbruch and R. H. Bube,Fundamentals of Solar Cells, Academic Press, NY (1983).
K. Heime, U. Konig, E. Kohn and A. Wortmann, Solid-State Electron. 17, 835 (1974).
H. M. Macksey, “Ohmic contacts for GaAs power FETs”,GaAs and Related Compounds (St. Louis), Inst. of Phys., London, 254 (1976).
E. Watson and D. Shaw, J. Phys. C16, 515 (1983).
F. A. Kroger, J. Phys. Chem. Solids26, 1717 (1965).
G. Mandel, Phys. Rev.134, A1073 (1964).
P. Hoschl and S. Kubalkova, Czech. S. Phys.B22, 530 (1972).
T. Ambridge and M. M. Faktor, J. Applied Electrochemistry4, 135(1974).
T. Ambridge, C. R. Elliott, and M. M. Faktor, J. Applied Electrochemistry3, 1 (1973).
T. Ambridge and M. M. Faktor, J. Applied Electrochemistry5, 319 (1975).
T. Ambridge and M. M. Faktor, “An electrochemical technique for automatic depth profiles of carrier concentration”, Inst. Phys. Conf. Ser. No. 24, 320 (1975).
A. Z. Li and A. G. Milnes, J. Crystal Growth62, 95 (1983).
The Polaron Semiconductor Profile Plotter Operating Manual, Bio-Rad Laboratories, Richmond, CA 94804.
Mirrolite GaAs Polishing Compound, Material Development Corporation, Santa Monica, CA 90401.
M. Hage-Ali, R. Stuck, A. N. Saxena and P. Siffert, Appl. Phys.19, 25 (1979).
J. G. Werthen, J. P. Haring, A. L. Fahrenbruch and R. H. Bube, J. Appl. Phys.54(10), 5982 (1983).
J. G. Werthen, J. P. Haring, A. L. Fahrenbruch, R. H. Bube, J. Phys. D. 16, 2391 (1983).
J. P. Haring, J. G. Werthen, and R. H. Bube, J. Vac. Sci. Technol.Al(3), 1469 (1983).
C. A. Mead and W. G. Spitzer, Phys. Rev. 134, A713 (1964).
M. H. Patterson and R. H. Williams, J. Crystal Growth,59, 281 (1984).
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Nozaki, S., Milnes, A.G. Specific contact resistivity of indium contacts to n-type CdTe. J. Electron. Mater. 14, 137–155 (1985). https://doi.org/10.1007/BF02656672
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DOI: https://doi.org/10.1007/BF02656672