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In situ monitoring of plasma ignition step during photoresist stripping using O2/N2 and O2/Ar

  • Original Paper - Fluids, Plasma and Phenomenology
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Abstract

The formation of ions and radicals is determined by plasma parameters defined in terms of electron temperature and electron density. Typically, invasive methods (Langmuir probes and cut-off probes) and non-invasive methods (optical emission spectroscopy) are used to characterize plasmas. Invasive approaches, conversely, exhibit limits owing to tip corrosion, while non-invasive methods exhibit limitations due to difficult calculations under high-pressure settings. The plasma ignition mechanism and plasma characteristics were connected in this investigation utilizing an optical plasma monitoring system sensor. The correlation between electron temperature and electron density was confirmed by determining the time required for the plasma to stabilize after ignition and the total light intensity emitted after stabilization. In addition, a photoresist strip process was used to link plasma characteristics with variations in plasma radical production. Then, the influence of the plasma characteristics on the process outcome was validated using the photoresist strip rate.

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Acknowledgements

This work was supported by the Korea Institute for Advancement of Technology (KIAT) with the WC 300 project (GID: G02P10810001102), and the authors are grateful to Dr. J.K. Choi and Mr. D.W. Kim in New Power Plasma, Co. Ltd. for their engineering support and technical discussions.

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  1. Department of Electronics Engineering, Myongji University, 116 Myongji-Ro, Yongin, Korea

    Kyung Eon Kim, Ju Eun Kang & Sang Jeen Hong

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  1. Kyung Eon Kim
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Correspondence to Sang Jeen Hong.

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Kim, K.E., Kang, J.E. & Hong, S.J. In situ monitoring of plasma ignition step during photoresist stripping using O2/N2 and O2/Ar. J. Korean Phys. Soc. 82, 173–180 (2023). https://doi.org/10.1007/s40042-022-00665-x

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