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X-ray lithography, where it is now, and where it is going

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Abstract

This paper describes the x-ray lithography (XRL) systems presently developed, including the present state of source, resist, mask technology, and exposure tools. Future directions in mask substrate materials, and alternative x-ray sources will be presented.

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  1. IBM General Technology Division (GTD), 12533, Hopewell Junction, N.Y.

    Juan R. Maldonado

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Maldonado, J.R. X-ray lithography, where it is now, and where it is going. J. Electron. Mater. 19, 699–709 (1990). https://doi.org/10.1007/BF02655238

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