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Development of a novel self-sensitive atomic force microscope for nondestructive measurement of micro vertical surfaces

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Abstract

A novel Atomic Force Microscope for the non-destructive measurement of micro vertical surfaces have developed. This AFM have two cameras for the precise alignment of the cantilever and sample, self-sensitive cantilever that enables nondestructive measurement of micro vertical surfaces, and piezo-driven stage for minute movements of the cantilever and sample stage. With our developed AFM, we can nondestructively measure the sidewalls of dry-etched silicon wafers as small as 400 μm wide and 100 μm high.

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Authors and Affiliations

  1. National Institute of Advanced Industrial Science and Technology (AIST), Namiki 1-2, Tsukuba, 305-8564, Ibaraki, Japan

    T. Kobayashi, Y. Murakoshi & R. Maeda

Authors
  1. T. Kobayashi
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  2. Y. Murakoshi
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  3. R. Maeda
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Corresponding author

Correspondence to T. Kobayashi.

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Kobayashi, T., Murakoshi, Y. & Maeda, R. Development of a novel self-sensitive atomic force microscope for nondestructive measurement of micro vertical surfaces. Microsystem Technologies 10, 423–425 (2004). https://doi.org/10.1007/BF02637115

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  • DOI: https://doi.org/10.1007/BF02637115

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