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Thermionic electrodes technology

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Abstract

In the thermionic two component system consisting of a refractory metal surface and Cs the only parameter that allows for an enhancing of efficiency is the nature of the metal surface. Surfaces obtained by the follwing techniques are studied: 1. radio-frequency inductive plasma sputtering, 2. van der Schueren evaporation, a sublimation technique, 3. vapor plating. The surfaces obtained by the mentioned techniques are studied as to their adhesion and grain size. A modified Shelton retarding current method allows for the determination of the distribution of work functions. The improvements in diode-efficiency to be obtained by improving the metal surfaces are probably limited. It has been shown that significant improvements can be hoped for by introducing a third component in the system. Thus techniques for the handling of barium are studied.

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Überarbeitete Fassung eines auf dem vom Institut für Kernenergetik der Universität Stuttgart veranstalteten zweiten Symposium über thermophysikalische Eigenschaften fester Stoffe gehaltenen Vortrags.

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Schins, H.E.J. Thermionic electrodes technology. Forsch Ing-Wes 38, 151–153 (1972). https://doi.org/10.1007/BF02573831

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