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Verunreinigunsprofile Unterschiedlich Bearbeiteter Siliziumproben

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Abstract

Impurity profiles of selected samples are determined by neutron activation analysis. After irradiation and cleaning with a mixture of hydrochloric and nitric acid a layer of 20 μm was etched with hydrofluoric and nitric acid. In the layer 0.5 ng/cm2 Cu and 3 ng/cm2 Fe were found. In cutted slides of zonefloated silicon we found a deep profile expressed by the equation c=co·exp-(x/a)2, co=2 ppm, a=190 μm.

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Literatur

  1. J. A. MARTIN, E. HAAS, G. FISCHER, Z. Anal. Chem., 265 (1973) 122.

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  1. Zentralinstitut für Kernforschung Rossendorf, Akademie der Wissenschaften der DDR, PSF 19, DDR-8051, Dresden, DDR

    S. Niese

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  1. S. Niese
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Niese, S. Verunreinigunsprofile Unterschiedlich Bearbeiteter Siliziumproben. J. Radioanal. Chem. 58, 195–204 (1980). https://doi.org/10.1007/BF02533788

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  • DOI: https://doi.org/10.1007/BF02533788

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