Abstract
The factors controlling the ice nucleation efficiency are studied in this paper on suitably chosen model substances, in particular on silicon. It is found that the critical supersaturation for the growth of ice on a (111)-plane of GaAs is 25% at −25°C; this quantity as well as the number of growing ice crystals (cm−2) were found to be independent of the dislocation density. The critical supersaturation for the growth of ice on the (111)-plane of Si is strongly dependent on the electrical conductivity of the crystals, but independent of the sign of the majority charge carriers. Epitaxial growth is observed on the hexagonal substrate GaSe only, but not on the cubic GaAs and Si.
On the basis of the classical nucleation theory the free energy of adsorption of H2O on GaSe ΔG ads =0,48 eV and the specific interfacial free energy σ SL =23,2 erg · cm−2 are evaluated. This indicates that the outermost layer of the ice embryo is in a liquid-like state.
Water adsorption isotherms were measured gravimetrically down to −20°C and were found to be of type II (BET, [33]). The amount of adsorbed water and the isosteric heat of adsorption at a given relative pressure depend on the doping of the sample.
From this it is concluded that low conductivity material had more adsorption sites than high conductivity material, but these fewer sites on the high conductivity samples were more active in collecting water molecules. The larger water clusters are formed on high conductivity samples in agreement with the higher nucleation efficiency observed in mixing cloud chamber experiments.
The electrical conductivity and the sign of the thermoelectric effect of a thin silicon on sapphire film have been measured as a function of oxygen and water vapor pressures. It is found that band bending towards ann-type surface occurred during water chemisorption on Si.
This indicates that chemisorbed water molecules act as donor surface states. The charge exchanged between adsorbate and adsorbent is larger on high conductivity samples on account of their higher initial surface potential.
Chemisorption sites on Si are proportional to the doping concentration and they produce relatively large water clusters. Hence doping results in a higher nucleation efficiency.
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Literaturverzeichnis
T. Bergeron, Proc. 5th Ass. UGGI, Lissabon2, 136 (1935).
D. Shaw undB. J. Mason, Phil. Mag.46, 249 (1955).
G. W. Bryant, J. Hallett undB. J. Mason, J. phys. Chem. Sol.12, 189 (1960).
T. H. Geballe, in:Semiconductors, N. B. Hannay, ed. (Reinhold Publ. Co., New York 1959), p. 329.
W. K. Burton, N. Cabrera undF. C. Frank, Phil. Trans.243, 300 (1951).
U. Zimmerli undA. Steinemann, in:Crystal Growth (Pergamon Press, London 1967), p. 81.
M. S. Abrahams, J. appl. Phys.35, 3626 (1964).
D. W. Pashley, Adv. in Physics14, 328 (1965).
M. Volmer undA. Weber, Z. phys. Ch,119, 277 (1925).
R. Becker undW. Doering, Ann. Phys.24, 719 (1935).
G. M. Pound, M. T. Simnad undL. Yang, J. chem. Phys.22, 1215 (1954).
D. Turnbull, Sol. State Phys.3, 225 (1956).
H. Poppa, J. appl. Phys.38, 3883 (1967).
J. Frenkel,Kinetic Theory of Liquids (Oxford Univ. Press, London 1946).
B. K. Chakraverty undG. M. Pound, Acta Met.12, 851 (1964).
J. P. Hirth undG. M. Pound,Condensation and Evaporation (Pergamon Press, London 1963).
N. H. Fletcher,The Physics of Rainclouds (Cambridge Univ. Press, 1962).
N. H. Fletcher, Phil. Mag.7, 225 (1962).
G. Srinivasan, J. J. Chessick undA. C. Zettlemoyer, J. phys. Chem.66, 1819 (1962).
V. Pravdic, E. McCafferty undA. C. Zettlemoyer, Surface Sci.7, 380 (1967).
A. Many, Y. Grover undN. B. Goldstein,Semiconductor Surfaces (North-Holland Publ. Co., 1965), p. 408.
S. J. Birstein, J. Meteorol.12, 324 (1955).
L. V. Coulter undG. A. Candela, Z. Elektroch.56, 449 (1952).
P. G. Hall undF. C. Tompkins, Trans. Faraday Soc.58, 1734 (1962).
A. C. Zettlemoyer, N. Tcheurekdjian, J. J. Chessik, Nature192, 653 (1961).
N. Tcheurekdjian, A. C. Zettlemoyer, J. J. Chessick, J. phys. Chem.68, 773 (1964).
M. L. Corrin, S. P. Moulik undB. Cooley, J. Atm. Sc.24, 530 (1967).
S. Brunauer, P. H. Emmett undE. Teller, J. Amer. chem. Soc.60, 309 (1938).
A. C. Zettlemoyer, N. Tcheurekdjian undCh. L. Hosler, Z. angew. Math. Phys.14, 496 (1963).
O. Jaentsch, J. phys. Chem. Sol.26, 1233 (1965).
H. P. Boehm, Adv. Catalysis16, 225 (1966).
R. A. W. Haul, Angew. Chem.68, 238 (1956).
S. Brunauer,Physical Adsorption of Gases (Oxford Univ. Press, 1945).
D. M. Young undA. D. Crowell,Physical Adsorption of Gases (Butterworths, London 1962), p. 82.
B. M. W. Trapnell,Chemisorption (Butterworths, London 1955), p. 144.
D. E. Meyer undN. Hackerman, J. phys. Chem.70, 2077 (1966).
T. L. Hill, P. H. Emmett undL. G. Joyner, J. Amer. chem. Soc.75, 5102 (1951).
J. T. Law, J. Phys. Chem. Sol.4, 91 (1958);M. Green, K. H. Maxwell, J. phys. Chem. Sol.13, 145 (1960).
J. T. Law, J. phys. Chem.59, 67 (1955).
F. M. Wanlass undH. Eyring, Adv. in Chemistry33, 140 (1961).
D. H. Everett, Trans. Faraday Soc.46, 942 (1950).
E. A. Moelwyk-Hughes,Physical Chemistry, 2nd ed., p. 453.
C. Kemball, Adv. Catalysis2, 233 (1950).
W. H. Brattain undJ. Bardeen, Bell System Tech. J.32, 1 (1953).
P. Aigrain undC. Dugas, Z. Elektrochem.56, 363 (1952).
K. Hauffe undH. J. Engell, Z. Elektrochem.56, 366 (1952).
P. B. Weisz, J. chem. Phys.20, 1483 (1952);21, 1531 (1953).
F. G. Allen undG. W. Gobeli, Phys. Rev.127, 141, 150 (1962).
H. M. Manasevit undW. I. Simpson, J. appl. Phys.35, 1349 (1964).
R. H. Kingston undS. F. Neustadter, J. appl. Phys.26, 718 (1955).
H. Statz, G. A. de Mars, L. Davis Jr. undA. Adams, in:Semiconductor Surface Physics (Univ. of Pennsylvania Press, 1957), p. 139.
R. H. Kingston, J. appl. Phys.27, 101 (1956).
J. T. Law, J. phys. Chem.61, 1200 (1957).
J. T. Law, J. appl. Phys.32, 600 (1961).
Ref. [21]A. Many, Y. Grover undN. B. Goldstein,Semiconductor Surfaces (North-Holland Publ. Co., 1965), p. 376.
M. Henzler, Phys. Stat. Sol.19, 833 (1967).
U. Katz, Z. angew. Math. Phys.13, 333 (1962).
S. Amelinckx undW. Dekeyser, Solid St. Phys.8, 325 (1959).
J. Bardeen, Phys. Rev.71, 717 (1947).
C. A. T. Salama, T. W. Tucker undL. Young, Solid-St. Electron.10, 339 (1967).
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Federer, B. Über den Einfluss der Oberflächeneigenschaften von Halbleitern auf ihre Eiskeimfähigkeit. Journal of Applied Mathematics and Physics (ZAMP) 19, 637–665 (1968). https://doi.org/10.1007/BF01594971
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DOI: https://doi.org/10.1007/BF01594971