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Strain-dependent induction by heat shock of resistance to ultraviolet light inEscherichia coli

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Abstract

Heat shock induces resistance to killing by ultraviolet light inEscherichia coli JE1011. When cells growing at 30°C were transferred to 42°C, maximum resistance to ultraviolet radition was reached after 30–45 min, but no change in heat resistance occurred. The effect was dependent on growth or protien synthesis. In contrast,E. coli B becomes more sensitive to the radiation and more heat resistant after a similar treatment. Thus, ultraviolet resistance and thermal resistance are not induced together in these two strains and may arise by independent mechanisms. It is also possible that thelon gene is involved in the effect of heat shock on ultraviolet resistance.

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Authors and Affiliations

  1. Department of Biochemistry, University of Ottawa, K1N 9B4, Ottawa, Ontario, Canada

    Dheerja Pardasani &  Peter S. Fitt

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  1. Dheerja Pardasani
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  2. Peter S. Fitt
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Pardasani, D., Fitt, P.S. Strain-dependent induction by heat shock of resistance to ultraviolet light inEscherichia coli . Current Microbiology 18, 99–103 (1989). https://doi.org/10.1007/BF01570832

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