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Dependence on thelon gene of the thermal induction of resistance to ultraviolet light inEscherichia coli

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Abstract

Our previous studies have shown thatEscherichia coli JE1011 possesses an errorfree DNA repair system that is inducible by heat shock or thiamine deprivation. However, it appears to be lacking inE. coli B, which islon −. We now show that a similar, thermally inducible, error-free system is present inE. coli AB1157, although it requires more severe heat shock for its induction. Thelon mutant of this strain is similar toE. coli B and does not become more UV-resistant after heat shock, so this gene appears to play an essential role in the process. All three strains become more resistant to heat inactivation at 55°C following a 30°C→48°C heat shock; this confirms that the induced UV and thermal resistances must arise by different mechanisms.

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Authors and Affiliations

  1. Department of Biochemistry, University of Ottawa, K1N 9B4, Ottawa, Ontario, Canada

    Dheerja Pardasani, Nishi Sharma &  Peter S. Fitt

Authors
  1. Dheerja Pardasani
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  2. Nishi Sharma
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  3. Peter S. Fitt
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Pardasani, D., Sharma, N. & Fitt, P.S. Dependence on thelon gene of the thermal induction of resistance to ultraviolet light inEscherichia coli . Current Microbiology 19, 129–133 (1989). https://doi.org/10.1007/BF01570580

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