Abstract
In this study the growth of Fe/Ag and Pd/Cu multilayers is investigated by using a molecular dynamics simulation method. In-plane and out-of-plane motions of the deposited atoms are observed for temperatures in the range 10 K–330 K.Furthermore the film structure shows a remarkable dependence on the deposition rate and temperature and these parameters may turn the growth from amorphous, or highly defective, to crystalline with defective interfaces. In this transition, however, the type of atom to be deposited plays a primary role and in our study a remarkable propensity of Fe for amorphization has been observed.
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