Abstract
A detailed experimental investigation of a D.C. discharge in an argon-silanenitrogen gas mixture is undertaken using mainly spatially resolved spectroscopy. Discharge parameters are studied as functions of the gas mixture composition, and the influence of nitrogen concentration on the dissociation phenomena of SiH4 and on dehydrogenation mechanisms of the growing film surface is particularly discussed.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
E. Badareu and I. Popescu,Gaz Ionisés, Décharges Électriques darts les Gaz, Dunod, Paris (1965).
J. D. Swift and M. J. R. Schwar,Electrical Probes for Plasma Diagnostics, London Iliffe Books Ltd. (1970).
D. Duchesne, Thesis, Limoges University (1988).
C. Girault, DEA report, Limoges University (1988).
J. Polman,Physica 34, 317 (1967).
D. Hopkin and W. G. Graham,Rev. Sci. Instrum. 57, 2210 (1986)
A. M. Pointu,Reactivité dans les Plasmas, Édition de Physique, Paris (1984).
F. Bastien, Wu Jiang Hua, E. Marode, and J. P. Boeuf, Proc. 8th ESCAMPIG, Greifwald D.D.R., August 26–29, 1986, p. 152.
J. P. Boeuf and E. Marode,J. Phys. D. d17, 1133 (1984).
M. Cacciatore and M. Capitelli,Chem. Phys. 66, 141 (1982).
H. Chatman and A. Gallagher,J. Appl. Phys. 58, 159 (1985).
R. Robertson and A. Gallagher,J. Appl. Phys. 59, 3402 (1986).
J. J. Wagner and S. Veprek,Plasma Chem. Plasma Process.2, 95 (1982);3, 219 (1983).
K. Ensslen and S. Veprek,Plasma Chem. Plasma Process.7, 139 (1987).
G. Turban,Pure Appl. Chem. 56, 215 (1984).
J. Perrin, Interactions Plasmas Froids Matériaux, Les Editions de Physique, Paris (1987), pp. 487–519 and references therein.
A. Matsuda and K. Tanaka,J. Non-Cryst. Solids 97–98, 1368 (1987).
S. Veprek,Thin Solid Films 175, 129 (1989).
C. Yamada and E. Hirota,Phys. Reu. Lett. 56, 923 (1986).
G. Inoue and M. Suzuki,Chem. Phys. Lett. 105, 641 (1984).
A. Lloret and L. Abouaf-Marguin.Chem. Phys. 107, 139 (1986).
A. Gallagher,J Appl. Phys. 60, 1369 (1986).
J. Perrin and J. J. M. Schmitt,Chem. Phys. Lett. 112, 69 (1984).
N. Kouchi, M. Ohno, K. Itok, N. Oda, and Y. Hatamo,Chem. Phys. 67, 287 (1982).
D. Duchesne, J. L. Jauberteau, J. Aubreton, and A. Catherinot, Proc. 8th ESCAMPIG, Greifswald D.D.R., August, 26–29, 1986, p. 77.
L. Bardos, J. Musil, and P. Taras,Thin Solid Films 102, 107 (1983).
L. Bardos, J. Musil, and P. Taras,J. Phys. D 15, L79 (1982).
W. Lindinger, F. Howorka, P. Lukac, S. Kuhn, H. Villinger, E. Alge, and H. Ramler,Phys. Rev. A 23, 2319 (1981).
J. L. Jauberteau, M. I. Baraton, M. M. Gerbier, P. Quintard, J. Desmaison, J. Aubreton, and A. Catherinot,J. Phys. (Paris),C5, 657 (1989).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Jauberteau, J.L., Duchesne, D., Girault, C. et al. Spectroscopic study of a D.C. discharge in an argon-silane-nitrogen gas mixture under silicon nitride thin film deposition conditions. Plasma Chem Plasma Process 10, 589–607 (1990). https://doi.org/10.1007/BF01447266
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF01447266