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Kinetics of formation of sulfur dimers in pure SF6 and SF6-O2 discharges

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Abstract

The emission band spectra of S, molecule (B3ζ u → X3ζ g transition) and of SO molecule (A3π→ X3ζ) were detected in SF6 and SF6-O2 rf discharges. It has been observed that the presence of a material which can be etched by SF6 products considerably enhances the density of S2 in the reactor. By means of mass spectrometry it has been shown that the m/e =83 mu signal assigned to S2F4 ions evolves exactly in the same manner as the S2 band intensity during the etching of Si or W in SF6-O2 discharge. A reaction scheme involving S2F radicals is proposed to explain these experimental results.

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References

  1. R. d'Agostino and D. L. Flamm,J. Appl. Phys. 52, 162 (1981).

    Google Scholar 

  2. I. C. Plumb and K. R. Ryan,Plasma Chem. Plasma Process,6, 247 (1986).

    Google Scholar 

  3. K. R. Ryan and I. C. Plumb,Plasma Chem. Plasma Process.8, 263 (1988).

    Google Scholar 

  4. K. R. Ryan and I. C. Plumb,Plasma Chem. Plasma Process.8, 281 (1988).

    Google Scholar 

  5. A. Picard and G. Turban,Plasma Chem. Plasma Process.5, 333 (1985).

    Google Scholar 

  6. A. Picard, G. Turban, and B. Grolleau,J. Phys. D 19, 991 (1986).

    Google Scholar 

  7. K. Ninomiya, K. Suzuki, S. Nishimatsu, and O. Okada,J. Appl. Phys. 62, 1459 (1987).

    Google Scholar 

  8. G. Turban, J. F. Coulon, and N. Mutsukura,Thin Solid Films 176, 289 (1989).

    Google Scholar 

  9. R. Gilbert, J. Castonguay, and A. Théorět,Can. J. Spectros. 25, 15 (1980).

    Google Scholar 

  10. J. Galvier, D. Henry, and N. Sadeghi, The Electrochem. Soc. Extended Abstracts 84–2 (1984), p.498. In this paper the spectrum was erroneously considered as characteristic of tungsten fluoride.

  11. H. M. Anderson, J. A. Merson, and R. W. Light,IEEE Trans. Plasma Sci. PS-14, 156 (1986). In this paper the spectrum was erroneously attributed to SF, fragments.

    Google Scholar 

  12. K. E. Greenberg and P. J. Hargis, Jr.,Appl. Phys. Lett. 54, 1974 (1989).

    Google Scholar 

  13. L. Herman and P. Pebenbak,J. Quant. Spectrosc. Radian. Transler 3, 247 (1963).

    Google Scholar 

  14. K. A. Meyer and D. R. Crosley,J. Chem. Phys. 59, 3153 (1973).

    Google Scholar 

  15. K. P. Huber and G. Herzberg.Molecular Spectra and Molecular Structure. IV. Constants of Diatomic Molecules, Van Nostrand, New York (1979).

    Google Scholar 

  16. J. M. Ricks and R. F. Barrow,Can. J. Phys. 47, 2423 (1969).

    Google Scholar 

  17. V. E. Merchant and M. L. Andrews,Appl. Opt. 19, 3113 (1980).

    Google Scholar 

  18. D. A. Peterson and L. A. Schlie,J. Chem. Phys. 73, 1551 (1980).

    Google Scholar 

  19. R. A. Gottscho and T. A. Miller,Pure Appl. Chem. 56, 189 (1984); R. W. Dreyfus, J. M. Jarinki, R. E. Walkup, and G. S. Selwyn, ibid.57, 1256 (1985).

    Google Scholar 

  20. R. d'Agostino, F. Cramarossa, S. de Benedictis, and G. Ferraro,J. Appl. Phys. 52, 1259 (1981).

    Google Scholar 

  21. R. A. Gottscho and V. M. Donnelly,J. Appl. Phys. 56, 245 (1984).

    Google Scholar 

  22. V. M. Donnelly, D. L. Flamm, W. C. Dautremont-Smith, and D. P. Werder,J. Appl. Phys. 55, 242 (1984).

    Google Scholar 

  23. R. E. Walkup, K. L. Saeger, and G. S. Selwyn,J. Chern. Phys. 84, 2668 (1986).

    Google Scholar 

  24. R. J. Seeböck and W. E. Khöhler,J. Appl. Phys. 64, 3855 (1988).

    Google Scholar 

  25. H. Debontride, J. Derouard, P. Edel, R. Romestain, N. Sadeghi, and J. P. Boeuf,Phys. Rev. A 40, 5208 (1989).

    Google Scholar 

  26. A. Mitchell, G. R. Scheller, R. A. Gottscho, and D. B. Graves,Phys. Rev. A 40, 5199 (1989).

    Google Scholar 

  27. G. Turban, B. Grolleau, P. Launay, and P. Briaud,Rev. Phys. Appl. 20, 609 (1985).

    Google Scholar 

  28. J. W. Coburn and M. Chen,J. Appl. Phys. 51, 3134 (1980).

    Google Scholar 

  29. R. D'Agostino, F. Cramarossa, and S. de Benedictis,Plasma Chern. Plasma Process.2, 213 (1982).

    Google Scholar 

  30. D. Z. Cao and D. W. Setser,J. Phrs. Chern. 92, 1169 (1988).

    Google Scholar 

  31. R. Colin,Can. J. Phys. 47, 979 (1969).

    Google Scholar 

  32. K. Masek, L. Laska, U. Perina, and J. Krasa,Acta Phrs. Slov. 33, 145 (1983).

    Google Scholar 

  33. K. A. Meyer and D. R. Crosley,J. Chem. Phys. 59, 1933 (1973).

    Google Scholar 

  34. G. L. Lo, R. Beaman, and D. W. Setser,Chem. Phys. Lett. 149, 384 (1988).

    Google Scholar 

  35. M. A. A. Clyne and J. P. Liddy,J. Chern. Soc. Faraday Trans. II 78, 1127 (1982); M. A. A. Clyne and P. H. Tennyson,ibid.,82, 1315 (1986).

    Google Scholar 

  36. K. R. Ryan and I. C. Plumb, ISPC 9, Pugnochiuso, September 89, Proceedings, Vol. 2, R. d'Agostino, ed., p.972.

  37. B. Siegel and P. Breisacher,J. Inorg. Chem. 31, 675 (1969); D. C. Frost, S. T. Lee, C. A. McDowell, and N. P. C. Westwood.J. Electron Spectros. Relat. Phenom. 12, 95 (1977).

    Google Scholar 

  38. J. Brunning and M. A. A. Clyne,J. Chern. Soc. Faraday Trans. 2,80, 1001 (1984).

    Google Scholar 

  39. F. Seel, E. Heinrich, W. Gombler, and R. Budenz,Chimica 23, 73 (1969); J. J. Wagner, Ph.D. Thesis, The University of Wisconsin, Milwaukee, Wisconsin, 1980.

    Google Scholar 

  40. D. W. Howgate and T. A. Bars, Jr.,J. Chern. Phys. 59, 2815 (1973).

    Google Scholar 

  41. M. Capitelli, C. Gorse, and G. D. Billing,Chern. Phys. 52, 299 (1980); B. Massabieaux, G. Gousset, M. Lefevre, and M. Péalat, J. Phys.48, 1939 (1987).

    Google Scholar 

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Sadeghi, N., Debontride, H., Turban, G. et al. Kinetics of formation of sulfur dimers in pure SF6 and SF6-O2 discharges. Plasma Chem Plasma Process 10, 553–569 (1990). https://doi.org/10.1007/BF01447264

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  • DOI: https://doi.org/10.1007/BF01447264

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