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Using liquid chemical etching to manufacture technological structures of minimum size

  • Approximate Methods of Solution of Applied Problems
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Abstract

We consider the effect of the electric field on the pulling of an etching liquid through holes in a thin insulating protective mask and the possibility of achieving high-resolution liquid etching for manufacturing LSI components of minimum size.

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References

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Authors
  1. I. V. Medvedev
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  2. N. I. Khodakovskii
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  3. V. A. Sherstyuk
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  4. G. A. Chechko
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  5. V. N. Sklepovoi
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Additional information

Institute of Cybernetics of the Ukrainian Academy of Sciences. Kiev University. Translated from Vychislitel'naya i Prikladnaya Matematika, No. 75, pp. 70–75, 1991.

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Medvedev, I.V., Khodakovskii, N.I., Sherstyuk, V.A. et al. Using liquid chemical etching to manufacture technological structures of minimum size. J Math Sci 72, 3105–3108 (1994). https://doi.org/10.1007/BF01259480

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  • DOI: https://doi.org/10.1007/BF01259480

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