Abstract
Si-Cr films of variable composition between pure silicon and pure chromium have been deposited by co-sputtering on to glass substrates and thermally oxidized silicon wafers. In order to assess the applications of the Si-Cr films to thin film resistors, the electrical characteristics of the films have been determined as a function of composition, thickness, thermal treatments, etc.
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Fernández, M., González, J.P., Albella, J.M. et al. Co-sputtered Si-Cr resistive films. J Mater Sci 22, 3703–3706 (1987). https://doi.org/10.1007/BF01161481
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DOI: https://doi.org/10.1007/BF01161481