Skip to main content
SpringerLink
Log in

Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering

  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

Titanium nitride (TiN) films were successfully deposited on different substrates (glass, SiO2 and Si) by direct-current (DC) reaction magnetron sputtering technique, and the structural, optical and electrical properties of samples were investigated. X-ray diffraction patterns showed the films deposited on Si substrates exhibit best crystallinity with a growth preferred orientation of (200) plane. Atomic force microscopy images revealed the films deposited on Si substrates exhibit best uniform distribution of grain size. Raman spectra indicated the Raman shifts of films on SiO2 and Si substrates moved towards higher frequency compared to films on glass substrates. Reflectance spectra suggested that the films deposited on Si substrates show highest reflectance in the infrared region and reached 0.98 at 900 nm. The films deposited on Si substrates presented the lowest resistivity of 50 µΩ cm.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8
Fig. 9
Fig. 10

Similar content being viewed by others

References

  1. G. Greczynski, S. Mraz, L. Hultman, J.M. Schneider, Appl. Phys. Lett. 108, 2695 (2016)

    Article  Google Scholar 

  2. F. Jiang, T.F. Zhang, B.H. Wu, Y. Yu, Y.P. Wu, Surf. Coat. Technol. 292, 54 (2016)

    Article  Google Scholar 

  3. J. Narayan. P. Tiwari, X. Chen, J. Singh, R. Chowdhury, Appl. Phys. Lett. 61, 1290 (1992)

    Article  ADS  Google Scholar 

  4. M. Ritala, M. Leskela, J. Dekker, C. Mutsaers, P.J. Soininen, Chem. Vapor. Depos. 5, 7 (2015)

    Article  Google Scholar 

  5. L. Zhang, H. Yang, X. Pang, K. Gao, A.A. Volinsky, Surf. Coat. Technol. 224, 121 (2013)

    Article  Google Scholar 

  6. Y. Shigesato, S. Takaki, T. Haranou, Appl. surf. Sci. 48, 269 (1991)

    Article  ADS  Google Scholar 

  7. F. Vaz, J. Ferreira, E. Ribeiro, L. Rebouta, Surf. Coat. Technol. 191, 320 (2005)

    Article  Google Scholar 

  8. S. Gautier, P. Komninou, P. Patsalas, T. Kehagias, Semicond. Sci. Technol. 18, 594 (2003)

    Article  ADS  Google Scholar 

  9. A.A. Irudayaraj, P. Kuppusami, S. Kalainathan, Surf. Eng. 24, 28 (2013)

    Article  Google Scholar 

  10. C.H.L. Weijtens, J. Electrochem. Soc. 138, 3433 (1991)

    Article  Google Scholar 

  11. C.H. Park, B.S. Jang, C.H. Lee, S. Sohn, J. Nanosci. Nanotechnol. 17, 8577 (2017)

    Article  Google Scholar 

  12. J. Musil, S. Kadlec, Vacuum 40, 438 (1990)

    Article  ADS  Google Scholar 

  13. L. Jiang, L. Gao, J. Am. Ceram. Soc. 89, 159 (2006)

    Article  Google Scholar 

  14. M.A. Jithin, K.L. Ganapathi, Sens. Actuator A Phys. 272, 199 (2018)

    Article  Google Scholar 

  15. X.H. Zhu, P. Gu, H.H. Wu, D.Y. Yang, Aip Adv. 7, 125326 (2017)

    Article  ADS  Google Scholar 

  16. D. Biro, M.F. Hasaneen, Vacuum 103, 78 (2014)

    Article  ADS  Google Scholar 

  17. A. Kavitha, R. Kannan, P.S. Reddy, J. Mater. Sci. Mater. El. 27, 10427 (2016)

    Article  Google Scholar 

  18. N. Arshi, J.Q. Lu, J. Mater. Sci. Mater. El. 24, 1194 (2013)

    Article  Google Scholar 

  19. B. Subramanian, M. Jayachandran, J. Appl. Electrochem. 37, 1069 (2007)

    Article  Google Scholar 

  20. Y.H. Cheng, B.K. Tay, S.P. Lau, J. Appl. Phys. 92, 1845 (2002)

    Article  ADS  Google Scholar 

  21. H.C. Choi, Y.M. Jung, S.B. Kim, Vib. Spectrosc. 37, 36 (2005)

    Article  Google Scholar 

  22. A. Lousa, J. Esteve, J.P. Mejia, A. Devia, Vacuum 81, 1508 (2007)

    Article  ADS  Google Scholar 

  23. G. Frank, E. Kauer, H. Kostlin, Thin Solid Films 77, 115 (1981)

    Article  Google Scholar 

  24. N. Arshi, J. Lu, K.J. Yun, G.L. Chan, Mater. Chem. Phys. 134, 843 (2012)

    Article  Google Scholar 

Download references

Acknowledgements

This work was supported by Natural Science Foundation of China (NSFC) No. 11675029 and Sichuan Province Science and Technology Program No. 2015GZ0194 and No. 2016FZ0018.

Author information

Authors and Affiliations

  1. College of Optoelectronic Technology, Chengdu University of Information Technology, Chengdu, 610225, People’s Republic of China

    Peng Gu, Jitao Li, Haihua Wu, Hui Sun & Dingyu Yang

  2. College of Intelligent Manufacturing, Sichuan University of Arts and Science, Dazhou, 635002, People’s Republic of China

    Xinghua Zhu

Authors
  1. Peng Gu
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Xinghua Zhu
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Jitao Li
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Haihua Wu
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Hui Sun
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. Dingyu Yang
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Dingyu Yang.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Gu, P., Zhu, X., Li, J. et al. Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering. Appl. Phys. A 124, 550 (2018). https://doi.org/10.1007/s00339-018-1981-y

Download citation

  • Received:

  • Accepted:

  • Published:

  • DOI: https://doi.org/10.1007/s00339-018-1981-y

Search

Navigation