Abstract
Defining an effective relaxation time which depends on the root mean square (rms) surface roughness and on the angle of incidence of electrons and then using the Boltzmann transport equation general expressions have been derived for the Hall coefficient and conductivity in thin metal films subjected to à transverse magnetic field. In the weak- and strong-field limits simple analytical equations have been proposed which reveal slight size effects in the Hall coefficient and in the magnetoresistance as well as à weak field dependence of these transport parameters in agreement with previous experiments. The theoretical predictions of the present model have been compared with those of the mean free path (mfp) method which constituted an extension of the Coney model. 1n conclusion a correlation between the respective size parameters,A, in the present model and, µ, in the mfp method is proposed.[/p]
Similar content being viewed by others
References
K. L. Chopra, “Thin Film Phenomena” (McGraw-Hill, New York, 1969) Ch. 6.
T. J. Coutts,Thin Solid Films 7 (1971) 77.
C. R. Tellier andA. J. Tosser, “Size Effect in Thin Films”, (Elsevier Scientific Publ. Co., Amsterdam, 1982).
E. H. Sondheimer,Adv. Phys. 1 (1952) 1.
J. E. Parrot,Proc. Phys. Soc. 85 (1965) 1143.
Y. Namba,Jpn J. Appl. Phys. 9 (1970) 1326.
S. Soffer,J. Appl. Phys. 38 (1967) 1710.
J. M. Ziman, “Electrons and Phonons” (Oxford University Press, London, 1962) Ch. 11.
K. M. Leung,Phys. Rev. B. 30 (1984) 647.
A. D. Tillu,J. Phys. D: Appl. Phys. 10 (1977) 1329.
J. R. Sambles andK. C. Elsom,ibid. 15 (1982) 1452
J. R. Sambles,Thin Solid Films 106 (1983) 321.
C. R. Tellier,J. Mater. Sci. Lett. 3 (1984) 464.
Idem, J. Mater. Sci. 20 (1985) 4514.
A. A. Cottey,Thin Solid Films 1 (1967–1968) 297.
E. H. Sondheimer,Phys. Rev. 80 (1950) 401.
C. R. Tellier, M. Rabel andA. J. Tosser,J. Phys. F: Metal Phys. 8 (1978) 2357.
C. R. Pichard andA. J. Tosser, C. R. Tellier,Thin Solid Films 81 (1981) 169.
V. P. Duggal andV. P. Nagpal,J. Appl. Phys. 42 (1971) 4500.
V. P. Duggal andRaj Rup,ibid. 40 (1969) 492.
C. K. Ghosh andA. K. Pal,ibid. 51 (1980) 2281.
R. A. Hoffman andD. R. Frankl,Phys. Rev. B 3 (1971) 1825.
M. Viard, J. P. Drexler andJ. Flechon,Thin Solid Films 35 (1976) 247.
M. Inoue, Y. Tamaki andH. Yagi,J. Appl. Phys. 45 (1974) 1562.
M. A. Jeppesen,ibid. 37 (1966) 1940.
I. B. Bhattacharya andD. L. Bhattacharya,Int. J. Electron 41 (1976) 285.
F. S. Blatt, “Physics of Electronic Conduction in Solids” (McGraw-Hill, New York, 1968) Ch. 7.
T. T. Sheng, R. B. Marcus, F. Alexander andW. A. Reed,Thin Solid Films 14 (1972) 289.
C. R. Tellier andA. J. Tosser,Electrocomp. Sci. Technol. 3 (1976) 85.
R. E. Hummet andA. J. Geier,Thin Solid Films 25 (1975) 335.
J. P. Chauvineau andC. Pariset,Surf. Sci. 36 (1973) 155.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Tellier, C.R. Surface roughness and transverse magnetic field dependence of the Hall coefficient and the magnetoresistance in thin metal films. J Mater Sci 22, 2906–2912 (1987). https://doi.org/10.1007/BF01086489
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF01086489