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High-temperature oxidation of silicon nitride-based ceramics by water vapour

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Abstract

Hot-pressed Si3N4, sintered Si3N4 and three kinds of sialon with different compositions were oxidized in dry air and wet nitrogen gas atmospheres at 1100 to 1350° C and 1.5 to 20 kPa water vapour pressure. All samples were oxidized by both dry air and water vapour at high temperature, and formed oxide films consisting of SiO2, Y2Si2O7 and Y4A1209. The oxidation rate was in the order sialon > sintered Si3N4 > hot-pressed Si3N4. The oxidation rate of sialon increased with increasing Y2O3 content, and oxidation kinetics obeyed the usual parabolic law. The oxidation rates in dry air and wet nitrogen were almost the same: the rate in wet nitrogen was unaffected by water vapour pressure above 1.5 kPa. The activation energy was about 800 kJ mol−1.

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References

  1. S. C. Singhal,J. Amer. Ceram. Soc. 59 (1976) 81.

    Google Scholar 

  2. Idem, J. Mater. Sci. 16 (1981) 2625.

    Google Scholar 

  3. W. C. Tripp andH. C. Graham,J. Amer. Ceram. Soc. 59 (1976) 399.

    Google Scholar 

  4. S. C. Singhal andF. F. Lange,ibid. 60 (1977) 190.

    Google Scholar 

  5. D. Cubicciotti andK. H. Lace,ibid. 61 (1978) 512.

    Google Scholar 

  6. Idem, J. Electrochem. Soc. 126 (1979) 1723.

    Google Scholar 

  7. A. Arias,J. Mater. Sci. 14 (1979) 1353.

    Google Scholar 

  8. M. H. Lewis andP. Barnard,ibid. 15 (1980) 449.

    Google Scholar 

  9. D. R. Clarke andF. F. Lange,J. Amer. Ceram. Soc. 63 (1980) 586.

    Google Scholar 

  10. J. G. Desmaison andF. L. Riley,J. Mater. Sci. 16 (1981) 2625.

    Google Scholar 

  11. A. Bouarroudj, P. Goursat andJ. L. Besson,ibid. 20 (1985) 1150.

    Google Scholar 

  12. C. P. Gazzara andD. R. Messeer,Amer. Ceram. Soc. Bull. 56 (1977) 777.

    Google Scholar 

  13. T. Sato, S. Ohtaki, T. Endo andM. Shimada,J. Amer. Ceram. Soc. 68 (1985) C320.

    Google Scholar 

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Authors and Affiliations

  1. Department of Applied Chemistry, Faculty of Engineering, Tohoku University, 980, Sendai, Japan

    T. Sato, K. Haryu, T. Endo & M. Shimada

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  1. T. Sato
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  2. K. Haryu
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  3. T. Endo
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  4. M. Shimada
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Sato, T., Haryu, K., Endo, T. et al. High-temperature oxidation of silicon nitride-based ceramics by water vapour. J Mater Sci 22, 2635–2640 (1987). https://doi.org/10.1007/BF01082156

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  • DOI: https://doi.org/10.1007/BF01082156

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