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Effect of short-circuiting on the oxidation kinetics of copper and its doped varieties in the temperature range of 523–1073 K

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Abstract

The influence of shorting circuitry attachment between metal-oxide and oxideoxygen interfaces on the oxidation kinetics of copper, lithium-doped copper (Li: 400 ppm), and chromium-doped copper (Cr: 12 ppm) have been studied in dry air\((P_{O_2 } = 21.27kPa)\) in the temperature range of 523–1073 K. Oxide film or scale growth under short-circuiting as well as under normal oxidation conditions conforms to the parabolic rate law. The oxidation kinetics under short-circuiting resulted in decreased rates for Cu and Li-doped Cu up to a temperature of 773 K, while Cr-doped Cu exhibited an enhancement in rate compared to its normal oxidation in the same temperature range. However, above 873 K, all three systems under shorting circuitry attachment exhibited enhanced rates compared to their normal oxidation rates in conformity to the existing theoretical model. Use of additional resistances in series in the outer short-circuit Pt path have clearly established that below 773 K Mott's fieldinduced migration plays the most important role, while at elevated temperatures Wagner's electrochemical potential-gradient factor acts as the main driving force in the scale-growth process. The results have been interpreted on the basis of average defect concentration, the electrochemical potential gradient, electrical field gradient, and transport coefficient in the Cu2O layer.

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Authors and Affiliations

  1. Department of Metallurgical and Materials Engineering, Indian Institute of Technology, 721302, Kharagpur, India

    S. K. Bose & S. K. Roy

  2. Department of Metallurgical Engineering, Regional Engineering College, 713209, Durgapur, India

    S. K. Mitra

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  1. S. K. Bose
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Bose, S.K., Mitra, S.K. & Roy, S.K. Effect of short-circuiting on the oxidation kinetics of copper and its doped varieties in the temperature range of 523–1073 K. Oxid Met 46, 73–107 (1996). https://doi.org/10.1007/BF01046885

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