Summary
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1.
In the chlorination of (CH3)3SiC6H5 and F3SiC6H5 in presence of iron, the trimethylsilyl group is orthopara orienting and the trifluorosilyl group is powerfully meta orienting.
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2.
In the chlorination of phenylsilanes the replacement of alkyl groups attached to the silicon by the more highly electronegative chlorine or fluorine atoms leads to change from ortho-para orientation to meta orientation. The dichlorination of Cl3SiC6H5 and of p-ClC6H4SiCl3 results in the formation of a complex mixture of reaction products.
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3.
Unlike chlorination in presence of iron powder, photochemical chlorination of (CH3)3SiC6H5 occurs only at the C-H bonds of the methyl groups.
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4.
Unlike the trichlorosilyl group, the trifluorosilyl groups and other groups directly attached to the aromatic nucleus are fairly readily eliminated during halogenation in presence of iron powder, which is evidently associated with the steric and induction effects of groups attached to silicon, with the electrophilic character of the silicon, and also with the ionic mechanism of the reactions.
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Literature cited
F. S. Kipping and N. W. Cusa, J. Chem. Soc. 1088 (1935).
A. D. Petrov, V. A. Ponomarenko, L. L. Mkhitaryan, and A. D. Snegova, Doklady Akad. Nauk SSSR100, 1107 (1955).
V. A. Ponomarenko and A. D. Snegova, Zhur. Obshchei Khim.27, 2067 (1957).
A. D. Petrov, M. I. Batuev, V. A. Ponomarenko, A. D. Snegova, A. D. Matveeva, and B. A. Sokolov, Zhur. Obshchei Khim.27, 2057 (1957).
U. Roshal', Zhur. Obshchei Khim.26, 1229 (1956).
R. A. Benkeser and H. R. Krysiak, J. Amer. Chem. Soc.75, 4528 (1953).
R. A. Benkeser and P. E. Brumfield, J. Amer. Chem. Soc.73, 4770 (1951).
J. L. Speier, J. Amer. Chem. Soc.75, 2930 (1953).
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Ponomarenko, V.A., Snegova, A.D. & Egorov, Y.P. Orientation in the chlorination and bromination of phenylsilanes containing SiF3 and Si(CH3)3 groups. Russ Chem Bull 9, 222–228 (1960). https://doi.org/10.1007/BF00942894
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DOI: https://doi.org/10.1007/BF00942894