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  1. 1.

    The reaction of ethyl bromide with silicon in presence of reduced copper was studied in the temperature range 260–380°.

  2. 2.

    The main reaction product was tribromoethylsilane, the yield of which increased considerably with rise in reaction temperature. As a result of the partial pyrolysis of ethyl bromide at the temperature of the formation of bromoethylsilanes, the formation of dibromodiethylsilane, and particularly of bromotriethylsilane, occurred to a much lower extent. The reaction products included also silicon compounds containing silicon-attached hydrogen, namely tribromo- and dibromoethyl-silanes.

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Literature cited

  1. N. S. Nametkin, Doctorate Thesis, (Moscow, 1956).

  2. N. S. Nametkin, A. V. Topchiev, and L. I. Kartasheva, Proc. Acad. Sci. USSR 101, 885 (1955).

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  3. A. V. Topchiev and N. S. Nametkin, Proc. Acad. Sci. USSR 78, 295 (1951).

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  4. A. V. Topchiev and N. S. Nametkin, J. Gen. Chem. 23, 76 (1953).

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  5. N. S. Nametkin, A. V. Topchiev, and T. I. Chernysheva, Proc. Acad. Sci. USSR 111, 1260 (1956).

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Topchiev, A.V., Nametkin, N.S. & Kartasheva, L.I. Reaction of ethyl bromide with silicon. Russ Chem Bull 7, 922–925 (1958). https://doi.org/10.1007/BF00911341

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  • DOI: https://doi.org/10.1007/BF00911341

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