Summary
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1.
The reaction of ethyl bromide with silicon in presence of reduced copper was studied in the temperature range 260–380°.
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2.
The main reaction product was tribromoethylsilane, the yield of which increased considerably with rise in reaction temperature. As a result of the partial pyrolysis of ethyl bromide at the temperature of the formation of bromoethylsilanes, the formation of dibromodiethylsilane, and particularly of bromotriethylsilane, occurred to a much lower extent. The reaction products included also silicon compounds containing silicon-attached hydrogen, namely tribromo- and dibromoethyl-silanes.
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Literature cited
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N. S. Nametkin, A. V. Topchiev, and T. I. Chernysheva, Proc. Acad. Sci. USSR 111, 1260 (1956).