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Thin-film aggregate color centers as media for frequency domain optical storage

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Abstract

Thin films of aggregate color centers have been produced by electron and ion irradiation of bulk alkali halide crystals. The transverse spatial distribution of the centers was controlled on a submicron scale using electron lithography. Photochemical hole burning has been accomplished for the first time in a thin film of color centers, using the 6070 Å zero-phononN 1 line produced by ion and electron irradiation of NaF crystals.

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Author notes

  1. C. Ortiz

    Present address: Instituto de Optica, Serrano 121, Madrid 6, Spain

  2. W. Lenth

    Present address: Institut für Angewandte Physik, Universität Hamburg, D-2000, Hamburg, Federal Republic of Germany

Authors and Affiliations

  1. IBM Research Laboratory, 5600 Cottle Road, 95193, San José, CA, USA

    C. Ortiz, R. M. Macfarlane, R. M. Shelby, W. Lenth & G. C. Bjorklund

Authors
  1. C. Ortiz
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  2. R. M. Macfarlane
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  3. R. M. Shelby
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  4. W. Lenth
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  5. G. C. Bjorklund
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Ortiz, C., Macfarlane, R.M., Shelby, R.M. et al. Thin-film aggregate color centers as media for frequency domain optical storage. Appl. Phys. 25, 87–90 (1981). https://doi.org/10.1007/BF00901277

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  • DOI: https://doi.org/10.1007/BF00901277

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